# US 2014/0196848 A1 · Finned shutter disk for a substrate process chamber

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- Number: US 2014/0196848 A1
- Document ID: US20140196848A1
- Status: Published application
- Kind: A1
- Application number: 13/742,692
- Filed: 2013-01-16
- Published: 2014-07-17
- Earliest claimed: 2013-01-16
- Assignees: Applied Materials, Inc.
- Applicants: Applied Materials, Inc.
- Inventors: BONNIE T. CHIA; SONG-MOON SUH; CHENG-HSIUNG MATTHEW TSAI; ROBERT DINSMORE; GLEN T. MORI
- Web page: https://patentgrep.com/patent/US20140196848A1

## CPC

- H01J 37/32715: {Workpiece holder}
- C23C 14/564: {Means for minimising impurities in the coating chamber such as dust, moisture, residual gases}
- H01J 37/32477: {characterised by the means for protecting vessels or internal parts, e.g. coatings}
- H01J 37/32853: {Hygiene}
- H01J 37/3405: {Magnetron sputtering}
- H01J 37/3417: {Arrangements}
- H01J 37/3423: {Shape}
- H01J 37/3447: {Collimators, shutters, apertures}
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.

## Claims

### Claim 1

A shutter disk for use in a process chamber, comprising:
a body having an outer perimeter;
a top surface of the body, wherein the top surface includes
a central portion having a substantially horizontal planar surface, and
at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter; and
a bottom surface of the body.

### Claim 2 (depends on 1)

The shutter disk of claim 1, wherein the downward angle of the angled surface is about 15 degrees to about 60 degrees.

### Claim 3 (depends on 1)

The shutter disk of claim 1, wherein the at least one angled structure includes a plurality of angled structures.

### Claim 4 (depends on 3)

The shutter disk of claim 3, wherein each of the plurality of angled structures is radially separated by a substantially horizontal planar surface.

### Claim 5 (depends on 3)

The shutter disk of claim 3, further comprising:
a plurality of radial support ridges, wherein each radial support ridge extends across at least two of the plurality of angled structures.

### Claim 6 (depends on 5)

The shutter disk of claim 5, wherein the plurality of radial support ridges includes a first set of radial support ridges extending radially inward from the top portion of the outermost angled structure, and a second set of radial support ridges that extend radially outward from an outer diameter of the central portion of the top surface.

### Claim 7 (depends on 1)

The shutter disk of claim 1, further comprising a double step connecting the bottom surface to the outer diameter.

### Claim 8 (depends on 7)

The shutter disk of claim 7, wherein the double step further comprises:
an outer step and an inner step, the outer step extending upward further into the body than the inner step.

### Claim 9 (depends on 7)

The shutter disk of claim 7, wherein the body includes a cutout portion formed in the bottom surface disposed radially inward of the double step.

### Claim 10 (depends on 1)

The shutter disk of claim 1, wherein the angled structures are annular angled structures.

### Claim 11 (depends on 1)

The shutter disk of claim 1, wherein the body of the shutter disk is solid and configured to substantially cover a substrate support when disposed over the substrate support.

### Claim 12 (depends on 1)

The shutter disk of claim 1, wherein the shutter disk is fabricated from a target material to be deposited on walls of a process chamber, or a process kit disposed in a process chamber, during a process chamber process.

### Claim 13 (depends on 1)

The shutter disk of claim 1, wherein the shutter disk is fabricated from a target material selected from a group consisting of aluminum, an aluminum alloy, titanium, and a metal composite.

### Claim 14

A process chamber, comprising:
a chamber body defining an inner volume;
a process kit disposed in the chamber body;
a substrate support disposed within the chamber body for supporting a substrate; and
a shutter disk fabricated from a target material, the shutter disk comprising:
a body having an outer perimeter; and
a top surface of the body, wherein the top surface includes at least one substantially horizontal planar surface, and at least one angled structure, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter.

### Claim 15 (depends on 14)

The process chamber of claim 14, wherein the downward angle of each of the angled surfaces is configured to facilitate uniform deposition of the target material of the shutter disk onto side walls of at least one of the process chamber or the process kit.

### Claim 16 (depends on 14)

The process chamber of claim 14, wherein the downward angle of each of the angled surfaces is about 15 degrees to about 60 degrees.

### Claim 17 (depends on 14)

The process chamber of claim 14, wherein the at least one angled structure includes a plurality of angled structures.

### Claim 18 (depends on 14)

The process chamber of claim 14, further comprising:
a lower carrier member having at least a portion of the lower carrier member disposed below a portion of the shutter disk to support the shutter disk and to create a protective overlap region that prevents exposure of the substrate support upon deformation of the shutter disk.

### Claim 19 (depends on 18)

The process chamber of claim 18, wherein the lower carrier member is a ring having a central opening, and wherein the lower carrier member supports the shutter disk such that a bottom surface of the shutter disk is disposed over a central opening of the lower carrier member.

### Claim 20 (depends on 19)

The process chamber of claim 19, wherein the bottom surface of the shutter disk includes a step feature disposed above a first feature of the lower carrier member, wherein the first feature of the lower carrier member supports the shutter disk using the step feature, and wherein the step feature of the upper disk member and the first feature of the lower carrier member form the protective overlap region.