# US 2014/0196664 A1 · System and method for tungsten hexafluoride recovery and reuse

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- Number: US 2014/0196664 A1
- Document ID: US20140196664A1
- Status: Published application
- Kind: A1
- Application number: 14/149,318
- Filed: 2014-01-07
- Published: 2014-07-17
- Earliest claimed: 2013-01-17
- Assignees: Air Products and Chemicals, Inc.
- Applicants: Air Products and Chemicals, Inc.
- Inventors: Andrew David Johnson; Rajiv Krishan Agarwal; Heui-Bok Ahn; William Jack Casteel, JR.; Eugene Joseph Karwacki, JR.; John Francis Lehmann; David Charles Winchester
- Web page: https://patentgrep.com/patent/US20140196664A1

## CPC

- H10P 14/24: using chemical vapour deposition [CVD]
- B01D 53/002: {by condensation}
- B01D 53/68: Halogens or halogen compounds
- C23C 16/4401: {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber}
- C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps}
- B01D 2257/553: Compounds comprising hydrogen, e.g. silanes
- B01D 2258/0216: from CVD treatment or semi-conductor manufacturing
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

Condensable materials, such as but not limited to tungsten fluoride (WF6), can be used deposit films in a chemical vapor deposition (CVD) process. Described herein are methods to collect and reuse the condensable materials that are unreacted in the production process rather than treat these materials as waste. In one embodiment, when a condensable material, such as gaseous WF6, is not supplied to the CVD reactor, it is redirected to a recovery cabinet for capture.

## Claims

### Claim 1

An apparatus for a recovery of a condensable material from a chemical process reactor that uses the condensable material, comprising;
(a) a chemical process reactor provided with one or more lines for introducing the condensable material in electrical communication with a process controller;
(b) an effluent line from the chemical process reactor capable of removing an unreacted condensable material introduced into the chemical process reactor;
(c) a recovery line having a connection to the effluent line wherein the recover line is upstream of the check valve and wherein the recovery line and sends the unreacted condensable material from the effluent line and to a recovery vessel;
(d) an automatic valve in the recovery line having a signal connection to the process controller;
(e) a process controller; and,
(f) the recovery vessel further comprising a cooling jacket in electrical communication with the process controller and capable of housing the unreacted condensable material.

### Claim 2 (depends on 1)

The apparatus of claim 1 wherein the condensable material comprises WF6.

### Claim 3 (depends on 1)

The apparatus of claim 1 wherein the condensable material comprises an organosilane.

### Claim 4 (depends on 1)

The apparatus of claim 1 wherein the condensable materials comprises an organometallic.

### Claim 5 (depends on 1)

The apparatus of claim 1 wherein the recovery vessel which collects the condensable material further comprises KF as a complexing agent.

### Claim 6 (depends on 1)

The apparatus of claim 1 wherein the recovery vessel comprises nickel.

### Claim 7 (depends on 1)

The apparatus of claim 1 wherein the recovery vessel is comprised of a nickel-plated material.