# US 2014/0196303 A1 · Process for curing low-dielectric constant material

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- Number: US 2014/0196303 A1
- Document ID: US20140196303A1
- Status: Published application
- Kind: A1
- Application number: 14/147,178
- Filed: 2014-01-03
- Published: 2014-07-17
- Earliest claimed: 2013-01-11
- Assignees: Ushio Denki Kabushiki Kaisha
- Applicants: Ushio Denki Kabushiki Kaisha
- Inventors: Makoto WASAMOTO; Tomoyuki Habu; Shintaro Yabu
- Web page: https://patentgrep.com/patent/US20140196303A1

## CPC

- F26B 3/28: by radiation, e.g. from the sun
- F26B: DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM (drying devices for combines A01D41/133; racks for drying fruit or vegetables A01F25/12; drying foodstuffs A23; drying hair A45D20/00; body-drying implements A47K10/00; drying household articles A47L; drying gases or vapours B01D; chemical or physical processes for dewatering or like separating liquids from solids B01D43/00; centrifugal apparatus B04; drying ceramics C04B33/30; drying yarns or fabrics in association with some other form of treatment D06C; drying frames for laundry without heating or positive air circulation, domestic laundry-or spin-driers, wringing or hot pressing laundry D06F; furnaces, kilns, ovens F27)

## Abstract

Provided is a low-dielectric constant material curing process including irradiating a low-dielectric constant material on a semiconductor substrate with ultraviolet rays. In the low-dielectric constant material curing process, the ultraviolet light source is a fluorescent lamp including: a light-emitting tube sealed and filled with a discharge gas containing xenon gas; a pair of electrodes for inducing a discharge in the interior space of the light-emitting tube; a dielectric material being interposed between the interior space and at least one of the pair of electrodes; and a phosphor layer formed on a surface of the light-emitting tube and containing a phosphor that is excited by light generated from the discharge gas by a discharge in the interior space. The phosphor emits ultraviolet rays having a wavelength within a range of 180 to 300 nm.

## Claims

### Claim 1

A low-dielectric constant material curing process comprising: irradiating a low-dielectric constant material on a semiconductor substrate with ultraviolet rays from an ultraviolet light source to cure the low-dielectric constant material, wherein the ultraviolet light source is a fluorescent lamp including: a light-emitting tube sealed and filled with a discharge gas containing xenon gas; a pair of electrodes for inducing a discharge in an interior space of the light-emitting tube; a dielectric material being interposed between the interior space and at least one of the pair of electrodes; and a phosphor layer formed on a surface of the light-emitting tube, the phosphor layer containing a phosphor that is excited by light generated from the discharge gas by a discharge in the interior space, and wherein the phosphor emits ultraviolet rays having a wavelength within a range of 180 to 300 nm.

### Claim 2 (depends on 1)

The low-dielectric constant material curing process according to claim 1, wherein the phosphor emits light having a peak wavelength within a range of 220 to 300 nm.

### Claim 3 (depends on 1)

The low-dielectric constant material curing process according to claim 1, wherein the phosphor is praseodymium-activated lanthanum phosphate.

### Claim 4 (depends on 1)

The low-dielectric constant material curing process according to claim 1, wherein the phosphor is praseodymium-activated yttrium-aluminum borate.

### Claim 5 (depends on 1)

The low-dielectric constant material curing process according to claim 1, wherein the phosphor is bismuth-activated yttrium-aluminum borate.