# US 2014/0194050 A1 · Gas purifier for wafer substrate accommodating unit > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0194050 A1 - Document ID: US20140194050A1 - Status: Published application - Kind: A1 - Application number: 13/834,796 - Filed: 2013-03-15 - Published: 2014-07-10 - Earliest claimed: 2013-01-07 - Assignees: Gudeng Precision Industrial Co., Ltd. - Applicants: Gudeng Precision Industrial Co, Ltd. - Inventors: MING-MO LO; CHENG-HSIN CHEN; TIEN-JUI LIN - Web page: https://patentgrep.com/patent/US20140194050A1 ## CPC - F24F 7/04: with ducting systems {, e.g. by double walls; with natural circulation (F24F7/02 takes precedence)} - H10P 72/1926: {characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier} - F24F: AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING (removing dirt or fumes from areas where they are produced B08B15/00; vertical ducts for carrying away waste gases from buildings E04F17/02; tops for chimneys or ventilating shafts, terminals for flues F23L17/02) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A gas purifier to be applied on a wafer substrate accommodating unit with an inlet hole includes an outer tube and an inner tube. The outer tube is disposed on the wafer substrate accommodating unit and has a plurality of first gas filling apertures. One end of the inner tube is a closed end and the other end is an open end. The inner tube has a plurality of second gas filling apertures, and its open end is interconnected with the inlet hole. The inner tube is movably disposed within the outer tube between a first operating position and second operating position. The second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at a first operating position, and interconnected with the first gas filling apertures when the inner tube is at a second operating position. ## Claims ### Claim 1 An gas purifier positioned in a wafer substrate accommodating unit including an inlet hole, comprising: an outer tube disposed on the wafer substrate accommodating unit and having a plurality of first gas filling apertures; and an inner tube having a closed end, an open end, and a plurality of second gas filling apertures, wherein the open end is interconnected with the inlet hole; wherein the inner tube is movably disposed in the outer tube between a first operating position and a second operating position, the second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at the first operating position, and the second gas filling apertures are interconnected with the first gas filling apertures when the inner tube is at the second operating position. ### Claim 2 (depends on 1) The gas purifier according to claim 1, further comprising at least one fixing board disposed on the outer surface of the outer tube, wherein the fixing board connects the outer tube and the wafer substrate accommodating unit. ### Claim 3 (depends on 1) The gas purifier according to claim 1, wherein one end of the outer tube is a closed end correspondingly configured to the closed end of the inner tube. ### Claim 4 (depends on 3) The gas purifier according to claim 3, wherein the closed end of the inner tube abuts the closed end of the outer tube when the inner tube is at the second operating position. ### Claim 5 (depends on 1) The gas purifier according to claim 1, wherein a restricting portion is disposed on an inner surface of the outer tube proximal to the connection between the outer tube and the wafer substrate accommodating unit and the open end of the inner tube abuts the restricting portion when the inner tube is at the first operating position. ### Claim 6 (depends on 1) The gas purifier according to claim 1, wherein the outer surface of the outer tube has a fixing portion, the fixing portion comprises an annular plate and a plurality of coupling protrusions disposed on the annular plate arranged between the outer tube and the wafer substrate accommodating unit. ### Claim 7 (depends on 1) The gas purifier according to claim 1, wherein the inner surface of the outer tube has at least one positioning groove, the periphery of the inner tube has at least one protruding portion movably disposed at the positioning groove. ### Claim 8 (depends on 7) The gas purifier according to claim 7, wherein the protruding portion is disposed on the open end of the inner tube. ### Claim 9 (depends on 1) The gas purifier according to claim 1, wherein the width of the first gas filling apertures is smaller than the width of the second gas filling apertures. ### Claim 10 A wafer substrate accommodating unit, comprising: a case having an inlet hole and an outlet hole; a wafer storage rack disposed within the case; and an gas purifier disposed within the case, comprising: an outer tube disposed on the wafer substrate accommodating unit and having a plurality of first gas filling apertures; and an inner tube disposed in the outer tube and having a closed end, an open end, and a plurality of second gas filling apertures, wherein the open end is interconnected with the inlet hole; wherein the inner tube is correspondingly configured to a first operating position and a second operating position in the outer tube and moves there-between, the second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at a first operating position, and the second gas filling apertures are interconnected with the first gas filling apertures when the inner tube is at a second operating position.