# US 2014/0193538 A1 · Dual-imprint pattern for apparatus

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- Number: US 2014/0193538 A1
- Document ID: US20140193538A1
- Status: Published application
- Kind: A1
- Application number: 14/160,220
- Filed: 2014-01-21
- Published: 2014-07-10
- Earliest claimed: 2010-09-30
- Assignees: Seagate Technology LLC
- Applicants: Seagate Technology LLC
- Inventors: Kim Y. Lee; Bing K. Yen; David S. Kuo; Koichi Wago; Shih-fu Lee; Dieter K. Weller
- Web page: https://patentgrep.com/patent/US20140193538A1

## CPC

- B29C 59/022: {characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.

## Claims

### Claim at position 1

1-20. (canceled)

### Claim 21

An apparatus, comprising:
an imprint template comprising a cross-hatched pattern,
wherein the cross-hatched pattern is characteristic of imprinting
a first pattern on the template with a first template and
a second pattern on the template with a second template, and
wherein the first pattern and the second pattern at least partially overlap to form the cross-hatched pattern; and
a backing plate bonded to the imprint template.

### Claim 22 (depends on 21)

The apparatus of claim 21, wherein the first pattern comprises a concentric line pattern.

### Claim 23 (depends on 21)

The apparatus of claim 21, wherein the second pattern comprises a radial line pattern.

### Claim 24 (depends on 23)

The apparatus of claim 23, wherein the radial line pattern comprises positive oblique radial lines, negative oblique radial lines, or a combination thereof.

### Claim 25 (depends on 21)

The apparatus of claim 21, wherein the cross-hatched pattern comprises protruding features arranged in radial zones across the imprint template.

### Claim 26 (depends on 25)

The apparatus of claim 25, wherein the protruding features maintain constant angular and radial pitch within each radial zone.

### Claim 27

An apparatus, comprising:
an imprint template comprising a cross-hatched pattern,
wherein the cross-hatched pattern is characteristic of imprinting
a first pattern on the template with a first template and
a second pattern on the template with a second template, and
wherein the first pattern and the second pattern at least partially overlap to form the cross-hatched pattern.

### Claim 28 (depends on 27)

The apparatus of claim 27, wherein the first pattern comprises a concentric line pattern, and wherein the second pattern comprises a radial line pattern.

### Claim 29 (depends on 28)

The apparatus of claim 28, wherein the second pattern comprises a radial line pattern of positive oblique radial lines, negative oblique radial lines, or a combination thereof.

### Claim 30 (depends on 28)

The apparatus of claim 28, wherein the cross-hatched pattern comprises protruding features arranged in radial zones across the imprint template.

### Claim 31 (depends on 30)

The apparatus of claim 30, wherein the protruding features maintain constant angular and radial pitch within each radial zone.

### Claim 32 (depends on 30)

The apparatus of claim 30, wherein the density of protruding features is about the same in each radial zone.

### Claim 33

An apparatus, comprising:
an imprint template comprising a dual-imprint pattern,
wherein the dual-imprint pattern is characteristic of imprinting
a first pattern on the template with a first template and
a second pattern on the template with a second template, and
wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.

### Claim 34 (depends on 33)

The apparatus of claim 33, wherein the dual-imprint pattern comprises a cross-hatched pattern.

### Claim 35 (depends on 33)

The apparatus of claim 33, wherein the first pattern comprises a concentric line pattern.

### Claim 36 (depends on 33)

The apparatus of claim 33, wherein the second pattern comprises a radial line pattern.

### Claim 37 (depends on 33)

The apparatus of claim 33, wherein the dual-imprint pattern comprises protruding features arranged in radial zones across the imprint template.

### Claim 38 (depends on 37)

The apparatus of claim 37, wherein the protruding features maintain constant angular and radial pitch within each radial zone, and wherein the density of protruding features is about the same in each radial zone.

### Claim 39 (depends on 33)

The apparatus of claim 33, wherein the dual-imprint pattern comprises protruding features skewed at inner and outer dimensions of the imprint template to accommodate head skew effects in corresponding patterned recording media of data storage devices.

### Claim 40 (depends on 33)

The apparatus of claim 33, further comprising a backing plate, wherein the imprint template is characteristic of a mandrel slice, and wherein the mandrel slice is bonded to the backing plate.