# US 2014/0193301 A1 · Method of generating a metamaterial, and a metamaterial generated thereof

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- Number: US 2014/0193301 A1
- Document ID: US20140193301A1
- Status: Published application
- Kind: A1
- Application number: 14/124,496
- Filed: 2012-06-06
- Published: 2014-07-10
- Earliest claimed: 2011-06-07
- Assignees: Nanyang Technological University
- Inventors: Qihua Xiong; Xinlong Xu; Jun Zhang
- Web page: https://patentgrep.com/patent/US20140193301A1

## CPC

- G01N 33/5308: {for analytes not provided for elsewhere, e.g. nucleic acids, uric acid, worms, mites}
- G01J 3/44: Raman spectrometry; Scattering spectrometry {; Fluorescence spectrometry}
- G01N 21/554: {detecting the surface plasmon resonance of nanostructured metals, e.g. localised surface plasmon resonance}
- G01N 21/658: {enhancement Raman, e.g. surface plasmons}
- G02B 1/002: {made of materials engineered to provide properties not available in nature, e.g. metamaterials}
- G03F 7/2037: {Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation}
- G02F 2202/30: Metamaterials
- G02F 2203/10: plasmon
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)
- G01J: MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY (light sources F21, H01J, H01K, H05B; investigating properties of materials by optical means G01N)
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

A method of generating a metamater-operable in the visible-infrared range is provided. The method comprises a) depositing a layer of a conductive material on a substrate; b) forming a layer of electron beam resist on the layer of conductive material; c) patterning the layer of electron beam resist using electron beam lithography to form a patterned substrate; d) depositing a layer of a noble metal on the patterned substrate; and e) removing the resist. A metamaterial operable in the visible-infrared range comprising split-ring resonators having a least line width of about 20 nm to about 40 nm on a substrate is provided. A transparent photonic device or a sensor for chemical or biological sensing comprising the metamaterial is also provided.

## Claims

### Claim 1

A method of fabricating a sensor having a metamaterial comprising split-ring resonators operable in the visible-infrared range, the method comprising
a) depositing a layer of a conductive material on a substrate;
b) forming a layer of electron beam resist on the layer of conductive material;
c) patterning the layer of electron beam resist using electron beam lithography to form a patterned substrate;
d) depositing a layer of a noble metal on the patterned substrate; and
e) removing the resist to generate the metamaterial comprising the split-ring resonators having a least line width of about 20 nm to about 40 nm on the substrate.

### Claim at position 2

2-11. (canceled)

### Claim 12

A metamaterial operable in the visible-infrared range fabricated by a method, the method comprising:
a) depositing a layer of a conductive material on a substrate;
b) forming a layer of electron beam resist on the layer of conductive material;
c) patterning the layer of electron beam resist using electron beam lithography to form a patterned substrate;
d) depositing a layer of a noble metal on the patterned substrate; and
e) removing the resist to generate the metamaterial comprising the split-ring resonators having a least line width of about 20 nm to about 40 nm on the substrate.

### Claim 13

A sensor for chemical or biological sensing comprising a metamaterial operable in the visible-infrared range comprising split-ring resonators having a least line width of about 20 nm to about 40 nm on a substrate.

### Claim 14 (depends on 13)

The sensor according to claim 13, further comprising linker molecules bonded to the surface of the metamaterial.

### Claim 15 (depends on 14)

The sensor according to claim 14, wherein the linker molecules are covalently bonded to the surface of the metamaterial.

### Claim 16 (depends on 14)

The sensor according to claim 14, wherein linker molecules comprises a functional group selected from the group consisting of thiol, amine, amide, nitro, carboxylic acid, cyano, and halogen.

### Claim 17 (depends on 16)

The sensor according to claim 16, wherein the linker molecules comprise a thiol group.

### Claim 18 (depends on 14)

The sensor according to claim 14, wherein the linker molecules are configured to be specifically associated with target analytes contained in a sample.

### Claim 19 (depends on 18)

The sensor according to claim 18 wherein the sample is derived from biological material.

### Claim 20 (depends on 18)

The sensor according to claim 18 wherein the sample comprises biomarkers.

### Claim 21 (depends on 20)

The sensor according to claim 20 wherein the sample is a chemical solution.

### Claim 22 (depends on 13)

The sensor according to claim 13, wherein the split-ring resonators have a least line width of about 20 nm to about 25 nm.

### Claim 23 (depends on 13)

The sensor according to claim 13, wherein the split-ring resonators are C-shaped, E-shaped, H-shaped, S-shaped, U-shaped, U-bar shaped, V-shaped, W-shaped or Y-shaped.

### Claim 24 (depends on 23)

The sensor according to claim 23, wherein the split-ring resonators are Y-shaped.

### Claim 25 (depends on 13)

The sensor according to claim 13, wherein the split-ring resonators comprise a noble metal.

### Claim 26 (depends on 25)

The sensor according to claim 25, wherein the noble metal comprises gold, silver, or alloys thereof.

### Claim 27 (depends on 26)

The sensor according to claim 26, wherein the noble metal is present as a layer having a thickness of about 5 nm to about 500 nm on the surface of the split-ring resonators.

### Claim 28 (depends on 27)

The sensor according to claim 27, wherein the thickness of the layer of noble metal is about 30 nm.

### Claim 29 (depends on 27)

The sensor according claim 27, further comprising a layer of conductive material between the layer of noble metal and the substrate.

### Claim 30 (depends on 29)

The sensor according to claim 29, wherein the layer of conductive material comprises a transparent material selected from the group consisting of indium tin oxide, indium zinc oxide, and tin oxide.

### Claim at position 22

31-45. (canceled)