# US 2014/0192339 A1 · Collector

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- Number: US 2014/0192339 A1
- Document ID: US20140192339A1
- Status: Published application
- Kind: A1
- Application number: 14/210,625
- Filed: 2014-03-14
- Published: 2014-07-10
- Earliest claimed: 2011-10-11
- Assignees: Carl Zeiss SMT GmbH
- Applicants: Carl Zeiss SMT GmbH
- Inventors: Ingo Saenger; Joerg Zimmermann; Daniel Kraehmer; Johannes Ruoff; Martin Meier; Frank Schlesener; Christoph Hennerkes; Wolfgang Singer
- Web page: https://patentgrep.com/patent/US20140192339A1

## CPC

- G03F 7/702: {Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems}
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- G02B 19/0023: {at least one surface having optical power}
- G02B 19/0047: {for use with a light source (G02B19/009, G02B19/0095 take precedence; details of lighting devices in general F21V; non-semiconductor lasers having optical devices external to the laser cavity H01S3/005)}
- G02B 19/0071: {adapted to illuminate a complete hemisphere or a plane extending 360 degrees around the source}
- G02B 19/0095: {for use with ultraviolet radiation}
- G02B 27/286: {for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another (G02B5/3083 takes precedence; light guide coupling means utilising polarising elements G02B6/34)}
- G03F 7/70166: {Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides}
- G03F 7/70175: {Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source}
- G03F 7/70566: {Polarisation control}
- G21K 1/062: {Devices having a multilayer structure}
- G21K 2201/061: characterised by a multilayer structure
- G21K 2201/064: having a curved surface
- G21K 2201/067: Construction details
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G21K: HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES

## Abstract

A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.

## Claims

### Claim at position 1

1-14. (canceled)

### Claim 15

A collector, comprising:
a collector shell comprising a reflective section,
wherein:
the collector shell has a first focus and a second focus different from the first focus;
the reflective section is configured so that during use of the collector:
radiation is reflected from the first focus into the second focus; and
a spectrum of angles of impingement on the reflective section is within a range of at most 10° around a predefined angle of impingement; and
the collector is a microlithography collector.

### Claim 16 (depends on 15)

The collector of claim 15, wherein the predefined angle of impingement deviates from the Brewster angle by at most 10°.

### Claim 17 (depends on 15)

The collector of claim 15, wherein the reflective section is configured so that, at the predefined angle of impingement, the reflective section has a reflectance of at least 50% for EUV radiation.

### Claim 18 (depends on 15)

The collector of claim 15, wherein the reflective section is a truncated cone.

### Claim 19 (depends on 15)

The collector of claim 15, wherein the reflective section is aspherical.

### Claim 20 (depends on 15)

The collector of claim 15, wherein the collector comprises an additional collector shell.

### Claim 21 (depends on 20)

The collector of claim 20, wherein the additional collector shell comprises a spherical surface section around the first focus.

### Claim 22 (depends on 20)

The collector of claim 20, wherein the additional collector shell has an opening configured to allow radiation to pass therethrough during use of the collector.

### Claim 23 (depends on 15)

The collector of claim 15, wherein the collector shell comprises a plurality of reflective sections.

### Claim 24 (depends on 23)

The collector of claim 23, wherein for each of the plurality of reflective sections, the reflective section is configured so that during use of the collector:
radiation is reflected from the first focus into the second focus; and
a spectrum of angles of impingement on the reflective section is within a range of at most 10° around a predefined angle of impingement.

### Claim 25 (depends on 24)

The collector of claim 24, wherein:
for each of the plurality of reflective sections, the reflective section is configured so that during use of the collector radiation emerging from a radiation source arranged at the first focus impinges the reflective section at angles of impingement in a spectrum of angles within a range of at most 10° around a predefined angle of impingement; and
the predefined angle of impingement is the same for each of the plurality of reflective sections.

### Claim 26 (depends on 24)

The collector of claim 24, wherein the predefined angle of impingement deviates from the Brewster angle by at most 10°.

### Claim 27 (depends on 24)

The collector of claim 24, wherein the reflective section is configured so that, at the predefined angle of impingement, the reflective section has a reflectance of at least 50% for EUV radiation.

### Claim 28 (depends on 15)

A system, comprising:
a radiation source; and
the collector of claim 15,
wherein the system is a microlithography illumination system.

### Claim 29 (depends on 15)

An apparatus, comprising:
an illumination system comprising the collector of claim 15; and
a projection optical unit,
wherein the apparatus is a microlithography projection exposure apparatus.

### Claim 30 (depends on 15)

A method of using a microlithography projection exposure apparatus comprising an illumination system and a projection optical unit, the method comprising:
using the illumination system to illuminate a reticle; and
using the projection optical unit to project at least a section of the reticle onto a light-sensitive material,
wherein the illumination system comprises the collector of claim 15.

### Claim 31

A system, comprising:
a radiation source configured to generate unpolarized radiation; and
a collector comprising a collector shell comprising a reflective section configured so that, during use of the system when the unpolarized radiation emerges from the radiation source and impinges on the reflective section, the unpolarized radiation is reflected into an intermediate focus so that the reflected radiation at the intermediate focus has a uniform polarization,
wherein the system is a microlithography illumination system.

### Claim 32 (depends on 31)

An apparatus, comprising:
an illumination system according to claim 31; and
a projection optical unit,
wherein the apparatus is a microlithography projection exposure apparatus.

### Claim 33 (depends on 31)

A method of using a microlithography projection exposure apparatus comprising an illumination system and a projection optical unit, the method comprising:
using the illumination system to illuminate a reticle; and
using the projection optical unit to project at least a section of the reticle onto a light-sensitive material,
wherein the illumination system comprises the collector of claim 31.

### Claim 34

A method, comprising:
impinging radiation on each reflective section of a collector shell within an angular range of at most 10° around a predefined angle of impingement for each reflective section,
wherein each reflective section of the collector shell is configured so the radiation is reflected into a predefined focus, thereby producing uniformly polarized radiation.