# US 2014/0192337 A1 · Lithographic apparatus, method of setting up a lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0192337 A1 - Document ID: US20140192337A1 - Status: Published application - Kind: A1 - Application number: 14/236,299 - Filed: 2012-07-24 - Published: 2014-07-10 - Earliest claimed: 2011-08-30 - Assignees: ASML Netherlands B.V. - Inventors: Arno Jan Bleeker; Erik Roelof Loopstra; Harmen Klaas Van Der Schoot; Danny Maria Hubertus Philips; Ruud Antonius Catharina Maria Beerens - Web page: https://patentgrep.com/patent/US20140192337A1 ## CPC - G03F 7/70641: {Focus} - G03F 7/7005: {by multiple sources, e.g. light-emitting diodes [LED] or light source arrays (addressable array sources specially adapted to produce patterns without a mask G03F7/70391)} - G03F 7/70275: {Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems} - G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices} - G03F 7/70308: {Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift} - G03F 7/70391: {Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays} - G03F 7/704: {Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358)} - G03F 7/70825: {Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power. ## Claims ### Claim 1 A lithographic apparatus comprising: a programmable patterning device, configured to provide a plurality of radiation beams; and a projection system comprising: a lens group array configured to project the plurality of radiation beams onto a substrate; and a focus adjuster in an optical path corresponding to a lens group of the lens group array, the focus adjuster comprising an optical element having substantially zero optical power. ### Claim 2 (depends on 1) The lithographic apparatus of claim 1, wherein the focus adjuster is configured to adjust a focal length of the optical path. ### Claim 3 (depends on 1) The lithographic apparatus of claim 1, wherein the focus adjuster is configured to adjust a focal position of the optical path. ### Claim 4 (depends on 1) The lithographic apparatus of claim 1, wherein the optical element comprises an entry surface and an exit surface through which the radiation beams enter and exit the optical element, respectively, wherein the entry surface and the exit surface are substantially flat surfaces. ### Claim 5 (depends on 1) The lithographic apparatus of claim 1, wherein the focus adjuster is attached to a frame. ### Claim 6 (depends on 5) The lithographic apparatus of claim 5, wherein the optical element is attached to the frame via a supporting component, and further comprising a laser output configured to irradiate a surface of the supporting component so as to at least partially melt a portion at and near the surface of the supporting component so that the supporting component bends as it cools, thereby adjusting the tilted orientation of the optical element. ### Claim 7 (depends on 1) The lithographic apparatus of claim 1, wherein the projection system comprises a plurality of the focus adjusters, each in a corresponding optical path corresponding to a lens group of the lens group array. ### Claim 8 (depends on 7) The lithographic apparatus of claim 7, wherein each focus adjuster is configured to adjust a focal length of the corresponding optical path such that all of the optical paths have substantially the same focal length. ### Claim 9 (depends on 7) The lithographic apparatus of claim 7, wherein each focus adjuster is configured to adjust a focal position of the corresponding optical path so as to form a certain angular separation between the optical paths. ### Claim 10 A lithographic apparatus comprising: an optical component connected to a frame; and a radiation output configured to irradiate a surface of the frame so as to at least partially melt a portion at and near the surface of the frame so that the portion contracts as it cools, thereby adjusting the position and/or orientation of the optical component. ### Claim 11 (depends on 10) The lithographic apparatus of claim 10, comprising a plurality of optical components, wherein the frame comprises a slit array such that each adjacent pair of optical components is separated by a slit of the slit array. ### Claim 12 (depends on 1) The lithographic apparatus of claim 1, wherein the projection system is configured to move the array of lenses with respect to the programmable patterning device during exposure of the substrate. ### Claim 13 (depends on 1) The lithographic apparatus of claim 1, comprising an actuator configured to cause the array of lenses to rotate relative to the programmable patterning device in a plane substantially perpendicular to the optical path. ### Claim 14 A method of setting up a lithographic apparatus, the lithographic apparatus comprising: a programmable patterning device, configured to provide a plurality of radiation beams, and a projection system comprising a lens group array configured to project the plurality of radiation beams onto a substrate, the method comprising: measuring, for each of a plurality of lens groups of the lens group array, a parameter of an optical path corresponding to the lens group; and providing in each optical path a focus adjuster comprising an optical element having substantially zero optical power. ### Claim 15 (depends on 14) A device manufacturing method comprising: the method of setting up a lithographic apparatus as claimed in claim 14; and using the set up lithographic apparatus to manufacture a device. ### Claim 16 A device manufacturing method comprising: providing a plurality of radiation beams; and projecting the plurality of radiation beams onto a substrate through a lens group array, wherein the plurality of radiation beams are projected onto the substrate via a focus adjuster comprising an optical element having substantially zero optical power in an optical path of a corresponding lens group of the lens group array. ### Claim 17 A method of adjusting a position and/or orientation of an optical component, connected to a frame, of a lithographic apparatus, the method comprising: irradiating a surface of the frame so as to at least partially melt a portion at and near the surface of the frame so that the portion contracts as it cools, thereby adjusting the position and/or orientation of the optical component.