# US 2014/0192301 A1 · Color Filter Substrate, Manufacturing Method Thereof and Liquid Crystal Panel > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0192301 A1 - Document ID: US20140192301A1 - Status: Published application - Kind: A1 - Application number: 13/811,688 - Filed: 2013-01-11 - Published: 2014-07-10 - Earliest claimed: 2013-01-09 - Assignees: Shenzhen China Star Optoelectronics Technology Co., Ltd. - Inventors: Chun-ming Wu - Web page: https://patentgrep.com/patent/US20140192301A1 ## CPC - G02B 5/22: Absorbing filters {(G02B5/201 - G02B5/208 take precedence)} - G02B 5/201: {in the form of arrays} - G02F 1/133516: {Methods for their manufacture, e.g. printing, electro-deposition or photolithography} - G02F 1/13394: {spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F1/133377 takes precedence)} - G03F 7/0035: {Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface} - G02F 1/133514: {Colour filters} - G02F 1/133519: {Overcoatings} - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract The present invention provides a color filter substrate, manufacturing method thereof and liquid crystal panel. The manufacturing method includes coating sequentially second photo-resist, third photo-resist and fourth photo-resist and performing respective exposure development to form RGB color-resist layer and form at least a protruding column on the BM layer; wherein the protruding column being formed by at least one of the three exposure developments; and forming common electrode layer covering RGB color-resist layer and the protruding column exceeding above top surface of the common electrode layer. As such, the present invention reduces the number of required lithography processes, simplifies the manufacturing process of color filter substrate and liquid crystal panel so as to reduce manufacturing cost. ## Claims ### Claim 1 A method of manufacturing color filter substrate, which comprises: providing a substrate; coating a first photo-resist on the substrate and performing exposure development on the first photo-resist to form a black matrix (BM) layer surrounding a plurality of divided areas; coating sequentially a second photo-resist, a third photo-resist and a fourth photo-resist and performing respective exposure development to form RGB color-resist layer in divided areas and form at least a protruding column on the BM layer; wherein the protruding column being formed by at least one of the three exposure developments; and forming common electrode layer on the substrate, the common electrode layer covering the RGB color-resist layer and the protruding column exceeding above top surface of the common electrode layer. ### Claim 2 (depends on 1) The method of manufacturing color filter substrate as claimed in claim 1, characterized in that the step of coating sequentially a second photo-resist, a third photo-resist and a fourth photo-resist and performing respective exposure development to form RGB color-resist layer in divided areas and form at least a protruding column on the BM layer further comprises: coating a second photo-resist on the substrate and performing exposure development on the second photo-resist to form a first red color-resist layer on the divided areas of the substrate and form at least a second red color-resist layer on the BM layer; coating a third photo-resist on the substrate and performing exposure development on the third photo-resist to form a first green color-resist layer on the divided areas of the substrate and form at least a second green color-resist layer on the second red color-resist layer; and coating a fourth photo-resist on the substrate and performing exposure development on the fourth photo-resist to form a first blue color-resist layer on the divided areas of the substrate and form at least a second blue color-resist layer on the second green color-resist layer; the stacked second red color-resist layer, second green color-resist layer and second blue color-resist layer form the protruding column; the first red color-resist layer, the first green color-resist layer and the first blue color-resist layer are located in different divided areas. ### Claim 3 (depends on 1) The method of manufacturing color filter substrate as claimed in claim 1, characterized in that the step of forming common electrode layer on the substrate, the common electrode layer covering the RGB color-resist layer and the protruding column exceeding above top surface of the common electrode layer further comprises: coating the common electrode layer on the substrate; and performing patterning process on the common electrode layer so that the protruding column exceeding above top surface of the common electrode layer, and exposing top surface of the BM layer not disposed with protruding column. ### Claim 4 (depends on 1) The method of manufacturing color filter substrate as claimed in claim 1, characterized in that the protruding column has a vertical cross-section shaped as a right ladder or rectangle. ### Claim 5 (depends on 4) The method of manufacturing color filter substrate as claimed in claim 4, characterized in that the protruding column has a maximum width less than the width of the corresponding BM layer. ### Claim 6 A color filter substrate, which comprises: a substrate, a black matrix (BM) layer, an RGB color-resist layer, a common electrode layer and at least a protruding column; the BM layer and the RGB color-resist layer being formed on a surface of same side of the substrate, the protruding column being disposed on the BM layer and being formed by at least one of three exposure developments forming the RGB color-resist layer; the common electrode layer covering the RGB color-resist layer and the protruding column exceeding top surface of the common electrode layer. ### Claim 7 (depends on 6) The color filter substrate as claimed in claim 6, characterized in that the RGB color-resist layer comprises a first color-resist layer, a second color-resist layer and a third color-resist layer; the protruding column is formed by one of the first color-resist layer, second color-resist layer and third color-resist layer or by stacking two or more of the first color-resist layer, second color-resist layer and third color-resist layer. ### Claim 8 (depends on 7) The color filter substrate as claimed in claim 7, characterized in that the protruding column has a vertical cross-section shaped as a right ladder or rectangle. ### Claim 9 (depends on 8) The color filter substrate as claimed in claim 8, characterized in that the protruding column has a maximum width less than the width of the corresponding BM layer. ### Claim 10 (depends on 6) The color filter substrate as claimed in claim 6, characterized in that the materials for the first color-resist layer, second color-resist layer and third color-resist layer are red pixel resin, green pixel resin and blue pixel resin respectively, and the common electrode layer is made of ITO. ### Claim 11 A liquid crystal panel, which comprises: a color filter substrate and an array substrate, disposed oppositely, wherein the color filter substrate further comprising: a substrate, a black matrix (BM) layer, an RGB color-resist layer, a common electrode layer and at least a protruding column; the BM layer and the RGB color-resist layer being formed on a surface of same side of the substrate, the protruding column being disposed on the BM layer and being formed by at least one of three exposure developments forming the RGB color-resist layer; the common electrode layer covering the RGB color-resist layer and the protruding column exceeding top surface of the common electrode layer. ### Claim 12 (depends on 11) The liquid crystal panel as claimed in claim 11, characterized in that the protruding column contacts the array substrate, and a gap exists between the top surface of the common electrode layer and the array substrate. ### Claim 13 (depends on 11) The liquid crystal panel as claimed in claim 11, characterized in that the RGB color-resist layer comprises a first color-resist layer, a second color-resist layer and a third color-resist layer; the protruding column is formed by one of the first color-resist layer, second color-resist layer and third color-resist layer or by stacking two or more of the first color-resist layer, second color-resist layer and third color-resist layer. ### Claim 14 (depends on 13) The liquid crystal panel as claimed in claim 13, characterized in that the materials for the first color-resist layer, second color-resist layer and third color-resist layer are red pixel resin, green pixel resin and blue pixel resin respectively, and the common electrode layer is made of ITO.