# US 2014/0191478 A1 · Device for holding a planar substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0191478 A1 - Document ID: US20140191478A1 - Status: Published application - Kind: A1 - Application number: 14/130,349 - Filed: 2012-07-02 - Published: 2014-07-10 - Earliest claimed: 2011-07-01 - Assignees: Mechatronic Systemtechnik GmbH - Inventors: Alexander Oremus - Web page: https://patentgrep.com/patent/US20140191478A1 ## CPC - H10P 72/78: using vacuum or suction, e.g. Bernoulli chucks - H10P 72/1916: {characterised by sealing arrangements} - H10P 72/76: using mechanical means, e.g. clamps or pinches - H10P 72/7604: {the wafers being placed on a susceptor, stage or support} - H10P 72/7606: {characterised by edge clamping, e.g. clamping ring} - H10P 72/7611: {characterised by edge profile or support profile} - H10P 72/7612: {characterised by lifting arrangements, e.g. lift pins} - H10P 72/7614: {characterised by a plurality of individual support members, e.g. support posts or protrusions} - Y10T 279/11: Vacuum - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A device (1) for holding a planar substrate (4), in particular for a wafer or an eWLB, is shown, with a support (2) which forms a supporting surface (3) for the substrate (2) and has at least one recess (5) provided in the region of the supporting surface (3) for the substrate (2), and with at least one holding means which is connected in terms of flow to said recess (6) and is intended for fixing the substrate (2) on the device (1) with the aid of a vacuum generated between the support (2) and substrate (4). In order to be able to grip a multiplicity of substrates of geometrically differing profile, it is proposed that the support (2) has at least one recess (6) with an elastic seal (7) which is designed to be movable from a position (9) protruding over the edge (8) of the recess (6) into a position (10) pulled back in relation to the edge (8) of the recess (6) or at most corresponding to said edge and which interacts with the recess (5) for sucking the full area of the substrate (4) onto the support (2). ## Claims ### Claim 1 Apparatus for holding a planar substrate (4), particularly for a wafer and/or eWLB, having a support (2) that forms a supporting surface (3) for the substrate (4), which has at least one recess (5) provided in the region of the supporting surface (3) for the substrate (4), and having at least one holding means (13) connected with this recess (5), in terms of flow, for fastening the substrate (4) onto the apparatus (1), using a partial vacuum generated between support (2) and substrate (4), wherein the support (2) has at least one recess (6) having an elastic seal (7), which is configured so that it can be moved from a position projecting beyond the edge (8) of the recess (6) into a position pulled back in relation to the edge (8) of the recess (6) or at most agreeing with this position (9, 10), and which works together with the recess (5) to draw the substrate (4) against the support (2) over its full area, by suction. ### Claim 2 (depends on 1) Apparatus according to claim 1, wherein the elastic seal (7) is configured so that it can be passively moved by the substrate (4). ### Claim 3 (depends on 1) Apparatus according to claim 1, wherein the recesses (5) are disposed distributed over the support (2). ### Claim 4 (depends on 1) Apparatus according to claim 1, wherein the recess (6) having the seal (7) forms a closed contour progression (19). ### Claim 5 (depends on 1) Apparatus according to claim 1, wherein the seal (7) essentially, preferably completely surrounds the recess (5) of the support (2) that has a partial vacuum. ### Claim 6 (depends on 1) Apparatus according to claim 1, wherein the recess (6) for the seal (7) divides the supporting surface (3) into two supporting surface portions (11, 12). ### Claim 7 (depends on 6) Apparatus according to claim 6, wherein the recess (6) for the seal (7) follows an edge-side supporting surface portion (11). ### Claim 8 (depends on 1) Apparatus according to claim 1, wherein at least one recess (6) having the seal (7) and at least one recess (5) connected with the holding means, in terms of flow, run concentrically. ### Claim 9 (depends on 1) Apparatus according to claim 1, wherein the seal (7) is connected with the bottom (15) of the recess (6) with a firm bond. ### Claim 10 (depends on 1) Apparatus according to claim 1, wherein the seal (7), which runs conically in cross-section, has two equal bending shanks (16, 17), in order to allow a tilting movement (18) of the seal (7) that is free in the tilting direction. ### Claim 11 (depends on 1) Apparatus according to claim 1, wherein the seal (7) is structured as a tubular seal. ### Claim 12 (depends on 1) Apparatus according to claim 1, wherein the support (2) has multiple recesses (6, 6′) having seals (7, 1′), which divide the support (2) into multiple supporting surface portions (11, 12, 14), which recesses (6, 6′) particularly run radially offset from one another. ### Claim 13 (depends on 12) Apparatus according to claim 12, wherein at least one recess (5 or 5′) of a supporting surface portion (11, 12 or 14) is connected with the holding means (13), in terms of flow, separately from the other recesses (5 or 5′).