# US 2014/0190636 A1 · Substrate processing apparatus

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- Number: US 2014/0190636 A1
- Document ID: US20140190636A1
- Status: Published application
- Kind: A1
- Application number: 13/942,647
- Filed: 2013-07-15
- Published: 2014-07-10
- Earliest claimed: 2013-01-09
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., Ltd
- Inventors: Dong-Seok Shin
- Web page: https://patentgrep.com/patent/US20140190636A1

## CPC

- H01J 37/32477: {characterised by the means for protecting vessels or internal parts, e.g. coatings}
- H01J 37/32495: {Means for protecting the vessel against plasma}
- H01J 37/32871: {Means for trapping or directing unwanted particles}
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

A substrate processing apparatus includes a processing chamber for processing a substrate, a shield at an inner wall of the processing chamber, and a connector attaching the shield to the inner wall of the processing chamber. The connector includes a groove and a protrusion respectively on opposing surfaces of the inner wall of the processing chamber and the shield.

## Claims

### Claim 1

A substrate processing apparatus comprising:
a processing chamber for processing a substrate;
a shield at an inner wall of the processing chamber; and
a connector attaching the shield to the inner wall of the processing chamber, the connector including a groove and a protrusion respectively on opposing surfaces of the inner wall of the processing chamber and the shield.

### Claim 2 (depends on 1)

The substrate processing apparatus of claim 1, wherein the groove of the connector comprises a dovetail groove extending along a surface of the shield, and the protrusion of the connector comprises a dovetail extending along an inner wall of the processing chamber corresponding to the dovetail groove.

### Claim 3 (depends on 2)

The substrate processing apparatus of claim 2, wherein the dovetail has an outer sidewall that forms an angle less than 90 degrees with respect to the inner wall of the processing chamber.

### Claim 4 (depends on 3)

The substrate processing apparatus of claim 3, wherein the connector comprises a fixing member configured to couple the dovetail to the inner wall of the processing chamber.

### Claim 5 (depends on 2)

The substrate processing apparatus of claim 2, wherein the shield comprises a protruding portion having a first thickness and a recessed portion having a second thickness less than the first thickness, and the dovetail groove is in the protruding portion of the shield.

### Claim 6 (depends on 5)

The substrate processing apparatus of claim 5, wherein the first thickness is in a range of 10 mm to 6 mm, and the second thickness is in a range of about 6 mm to about 3 mm.

### Claim 7 (depends on 1)

The substrate processing apparatus of claim 1, wherein the groove of the connector comprises a dovetail groove extending along the inner wall of the processing chamber, and the protrusion of the connector comprises a dovetail extending along the shield corresponding to the dovetail groove.

### Claim 8 (depends on 1)

The substrate processing apparatus of claim 1, wherein the shield comprises an upper shield at an upper inner wall of the processing chamber and a lower shield at a lower inner wall of the processing chamber.

### Claim 9 (depends on 1)

The substrate processing apparatus of claim 1, wherein the shield comprises aluminum.

### Claim 10 (depends on 1)

The substrate processing apparatus of claim 1, further comprising a substrate stage configured to hold the substrate.

### Claim 11 (depends on 1)

The substrate processing apparatus of claim 1, wherein the groove of the connector extends from a lower surface of the shield in a first direction, and the protrusion of the connector protrudes from a bottom face of the processing chamber.

### Claim 12 (depends on 1)

The substrate processing apparatus of claim 1, wherein the connector detachably attaches the shield to the inner wall of the processing chamber.

### Claim 13 (depends on 1)

The substrate processing apparatus of claim 1, wherein the groove and the protrusion are slidably fitted to each other.