# US 2014/0190635 A1 · Plasma chamber and apparatus for treating substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0190635 A1 - Document ID: US20140190635A1 - Status: Published application - Kind: A1 - Application number: 14/141,740 - Filed: 2013-12-27 - Published: 2014-07-10 - Earliest claimed: 2013-01-04 - Assignees: Industry-University Cooperation Foundation Hanyang University; Psk Inc. - Applicants: Psk Inc. - Inventors: Jong Sik LEE; Jeonghee CHO; Hyun Jun KIM; Chin Wook CHUNG; Duksun HAN - Web page: https://patentgrep.com/patent/US20140190635A1 ## CPC - H01J 37/3211: {Antennas, e.g. particular shapes of coils} - H01J 37/321: {the radio frequency energy being inductively coupled to the plasma} - H01J 37/32174: {Circuits specially adapted for controlling the RF discharge} - H01J 37/32357: {Generation remote from the workpiece, e.g. down-stream} - H01J 37/32458: {Vessel} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract Provided are a plasma chamber and a substrate treating apparatus. The plasma chamber includes a housing in which a gas is injected to generate plasma, a first coil disposed on one surface of the housing, and a second coil disposed on the other surface of the housing. ## Claims ### Claim 1 A plasma chamber comprising: a housing in which a gas is injected to generate plasma; a first coil disposed on one surface of the housing; and a second coil disposed on the other surface of the housing. ### Claim 2 (depends on 1) The plasma chamber of claim 1, wherein the housing has a pillar shape, the first coil is disposed on a top surface of the housing, and the second coil is disposed on a side surface of the housing. ### Claim 3 (depends on 1) The plasma chamber of claim 1, wherein the housing has a shape in which a plurality of pillars having bottom areas different from each other are connected to each other, the first coil is disposed on a side surface of a first pillar of the plurality of pillars, and a second coil is disposed on a side surface of a second pillar of the plurality of pillars. ### Claim 4 (depends on 1) The plasma chamber of claim 1, wherein the housing has a shape in which a plurality of pillars having bottom areas different from each other are connected to each other, the first coil is disposed on a side surface of a first pillar of the plurality of pillars, and a second coil is disposed on a top surface of a second pillar of the plurality of pillars. ### Claim 5 (depends on 4) The plasma chamber of claim 4, wherein the first pillar has a bottom area less than that of the second pillar. ### Claim 6 (depends on 4) The plasma chamber of claim 4, further comprising a third coil disposed on a top surface of the first pillar. ### Claim 7 (depends on 4) The plasma chamber of claim 4, further comprising a fourth coil disposed on a side surface of the second pillar. ### Claim 8 (depends on 1) The plasma chamber of claim 1, wherein the housing has a shape in which a cone pyramid is connected between a plurality of pillars having bottom areas different from each other, the first coil is disposed on a side surface of one pillar of the plurality of pillars, and the second coil is disposed on a side surface of the cone pyramid. ### Claim 9 (depends on 8) The plasma chamber of claim 8, further comprising a fifth coil disposed on a side surface of the other pillar of the plurality of pillars. ### Claim 10 (depends on 1) The plasma chamber of claim 1, wherein one of the first and second coils is wound around a core and disposed on a side surface of the housing. ### Claim 11 (depends on 1) The plasma chamber of claim 1, wherein the first and second coils are connected to an RF power source for providing an RF signal. ### Claim 12 (depends on 11) The plasma chamber of claim 11, wherein the first and second coils are connected to the RF power source in parallel. ### Claim 13 (depends on 11) The plasma chamber of claim 11, further comprising: a first variable capacitor connected to an input terminal of the first coil in series; and a second variable capacitor connected to an input terminal of the second coil in series. ### Claim 14 (depends on 11) The plasma chamber of claim 11, further comprising: a first capacitive device connected to a ground terminal of the first coil in series; and a second capacitive device connected to a ground terminal of the second coil in series. ### Claim 15 (depends on 14) The plasma chamber of claim 14, wherein impedance of the first capacitive device is set to a half of that of the first coil, and Impedance of the second capacitive device is set to a half of that of the second coil. ### Claim 16 A substrate treating apparatus comprising: a process unit providing a space in which a substrate is disposed to plasma-treat the substrate; and a plasma generation unit generating plasma from a gas to supply the generated plasma into the process unit, wherein the plasma generation unit comprises: an RF power source for providing an RF signal a housing in which a gas is injected to generate plasma; a first coil disposed on one surface of the housing, the first coil receiving the RF signal to induce electromagnetic fields in the housing; and a second coil disposed on the other surface of the housing, the second coil receiving the RF signal to induce electromagnetic fields in the housing. ### Claim 17 (depends on 16) The substrate treating apparatus of claim 16, wherein the housing has a pillar shape, the first coil is disposed on a top surface of the housing, and the second coil is disposed on a side surface of the housing. ### Claim 18 (depends on 16) The substrate treating apparatus of claim 16, wherein the housing has a shape in which a plurality of pillars having bottom areas different from each other are connected to each other, the first coil is disposed on a side surface of a first pillar of the plurality of pillars, and a second coil is disposed on a side surface of a second pillar of the plurality of pillars. ### Claim 19 (depends on 16) The substrate treating apparatus of claim 16, wherein the housing has a shape in which a plurality of pillars having bottom areas different from each other are connected to each other, the first coil is disposed on a side surface of a first pillar of the plurality of pillars, and a second coil is disposed on a top surface of a second pillar of the plurality of pillars. ### Claim 20 (depends on 19) The substrate treating apparatus of claim 19, wherein the first pillar has a bottom area less than that of the second pillar. ### Claim 21 (depends on 19) The substrate treating apparatus of claim 19, wherein the plasma generation unit further comprises a third coil disposed on a top surface of the first pillar. ### Claim 22 (depends on 19) The substrate treating apparatus of claim 19, wherein the plasma generation unit further comprises a fourth coil disposed on a side surface of the second pillar. ### Claim 23 (depends on 16) The substrate treating apparatus of claim 16, wherein the housing has a shape in which a cone pyramid is connected between a plurality of pillars having bottom areas different from each other, and the second coil is disposed on a side surface of the cone pyramid. ### Claim 24 (depends on 23) The substrate treating apparatus of claim 23, wherein the plasma generation unit further comprises a fifth coil disposed on a side surface of the other pillar of the plurality of pillars. ### Claim 25 (depends on 16) The substrate treating apparatus of claim 16, wherein one of the first and second coils is wound around a core and disposed on a side surface of the housing.