Lithography aware leakage analysis
AssigneeSynopsys, Inc.
InventorsEmre Tuncer, Hui Zheng, Vivek Raghavan, Anirudh Devgan, Amir Ajami, Alessandra Nardi, Tao Lin, Pramod Thazhathethil, Alfred Wong
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AssigneeSynopsys, Inc.
InventorsEmre Tuncer, Hui Zheng, Vivek Raghavan, Anirudh Devgan, Amir Ajami, Alessandra Nardi, Tao Lin, Pramod Thazhathethil, Alfred Wong
Estimating the term…
A method for performing leakage analysis includes receiving information specifying an integrated circuit. A neighborhood of shapes associated with the integrated circuit is then determined Leakage information associated with the integrated circuit is generated based on the neighborhood of shapes. The neighborhood of shapes may be determined by determining a first set of spacings to a boundary of a first cell from an internal shape. A second set of spacings may be determined from the boundary of the first cell to a shape of a second cell. A lithography process may be characterized using the first and second set of spacings.
1-20. (canceled)
A method for calculating neighborhood spacings, the method comprising:
A computer program product stored on a computer readable medium for calculating neighborhood spacings, the computer program product comprising:
26-27. (canceled)
Dependencies are inferred from the claim text.