Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
AssigneeHitachi Kokusai Electric Inc.
InventorsArito OGAWA, Tsuyoshi TAKEDA
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Abstract
A method of manufacturing a semiconductor device, includes: alternately performing (i) a first step of alternately supplying a first raw material containing a first metal element and a halogen element and a second raw material containing a second metal element and carbon to a substrate by a first predetermined number of times, and (ii) a second step of supplying a nitridation raw material to the substrate, by a second predetermined number of times, wherein alternating the first and second steps forms a metal carbonitride film containing the first metal element having a predetermined thickness on the substrate.
Claims18
A method of manufacturing a semiconductor device, comprising:
- alternately performing a first step of supplying a first raw material containing a first metal element and a halogen element to a substrate and a second step of supplying a second raw material containing a second metal element and carbon to the substrate by one or more times, thereby forming a metal carbide film containing the first metal element on the substrate.
A method of processing a substrate, comprising:
- alternately performing a first step of supplying a first raw material containing a first metal element and a halogen element to a substrate and a second step of supplying a second raw material containing a second metal element and carbon to the substrate by one or more times, thereby forming a metal carbide film containing the first metal element on the substrate.
A substrate processing apparatus comprising:
- a process chamber configured to accommodate a substrate;
- a first raw material supply system configured to supply a first raw material containing a first metal element and a halogen element to the substrate in the process chamber;
- a second raw material supply system configured to supply a second raw material containing a second metal element and carbon to the substrate in the process chamber;
- and
- a control unit configured to control the first raw material supply system and the second raw material supply system so as to alternately perform a first processing of supplying the first raw material to the substrate in the process chamber and a second processing of supplying the second raw material to the substrate in the process chamber by one or more times, thereby forming a metal carbide film containing the first metal element on the substrate.
A non-transitory computer-readable recording medium storing a program that causes a computer to perform a process comprising:
- alternately performing a first step of supplying a first raw material containing a first metal element and a halogen element to a substrate and a second step of supplying a second raw material containing a second metal element and carbon to the substrate by one or more times, thereby forming a metal carbide film containing the first metal element on the substrate.
Dependencies are inferred from the claim text.