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US 2014/0179069 A1Published application
Fabrication method of semiconductor apparatus
AssigneeSK hynix Inc.
InventorsYoung Ho LEE, Seung Beom BAEK
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Abstract
A method of fabricating a semiconductor apparatus includes forming an insulating layer on a semiconductor substrate, forming a source post in the insulating layer, and forming a semiconductor layer over the source post and the insulating layer.
Claims12
A method of fabricating a semiconductor apparatus, the method comprising:
- forming an insulating layer on a semiconductor substrate;
- forming a source post in the insulating layer;
- and
- forming a semiconductor layer directly over the source post and the insulating layer.
1 more element
Dependencies are inferred from the claim text.