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US 2014/0178825 A1Published application
Developer
AssigneeJsr Corporation
InventorsTaiichi FURUKAWA, Hirokazu SAKAKIBARA
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Abstract
A developer includes an organic solvent and a nitrogen-containing compound. The developer is configured to develop a resist film to form a negative resist pattern. The resist film is formed using a photoresist composition. The photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer includes a structural unit including an acid-labile group.
Claims2
A developer comprising:
- an organic solvent;
- and
- a nitrogen-containing compound,
- the developer being configured to develop a resist film to form a negative resist pattern, the resist film being formed using a photoresist composition comprising:
- a polymer that includes a structural unit including an acid-labile group;
- and
- a radiation-sensitive acid generator.
4 more elements
Dependencies are inferred from the claim text.