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US 2014/0178822 A1Published application
Photosensitive polysiloxane composition and uses thereof
AssigneeChi Mei Corporation
InventorsMING-JU WU, CHUN-AN SHIH
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Abstract
The invention relates to a photosensitive polysiloxane composition that has good thermal transmittance, good chemical resistance and good sensitivity and good refractivity. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.
Claims18
A photosensitive polysiloxane composition comprising:
- a polysiloxane polymer (A);
- an ortho-naphthoquinone diazide sulfonic acid ester (B);
- an urethane (metha)acrylate compound (C), wherein the urethane (metha)acrylate compound (C) comprises at least six (meth)acryloyl groups in one molecule;
- inorganic particles (D), wherein the Group IV element oxide is a main component of the inorganic particles (D);
- and
- a solvent (E).
3 more elements
Dependencies are inferred from the claim text.