Resist composition, patterning process and polymer
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Koji Hasegawa, Kenji Funatsu
Life of this patent
Estimating the term…
Abstract
An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.
Claims11
A resist composition comprising a polymer capable of increasing alkali solubility under the action of acid as base resin, and a polymer comprising recurring units (p) of the general formula (1) as polymeric additive,
- wherein R1 is a straight or branched C1-C4 alkylene group, R2 is hydrogen, C1-C15 acyl group or acid labile group, R3 is hydrogen, methyl or trifluoromethyl, and p is in the range:
- 0<p≦1.0.
A polymer represented by the general formula (2) and having a weight average molecular weight of 1,000 to 500,000,
- wherein R1 is a straight or branched C1-C4 alkylene group, R2 is hydrogen, C1-C15 acyl group or acid labile group, R3 is hydrogen, methyl or trifluoromethyl, R4 is hydrogen or methyl, X1 is a single bond, —C(═O)—O— or —O—, X2 and X3 each are phenylene or naphthylene, X4 is methylene, oxygen or sulfur, R5 is a C6-C20 aryl or aralkyl group which may contain a hydroxyl, straight, branched or cyclic alkyl or alkoxy, ester (—OCOR or —COOR wherein R is C1-C6 alkyl), ketone (—COR wherein R is C1-C6 alkyl), fluorine, trifluoromethyl, nitro, amino or cyano moiety, R6, R7, R8, and R9 are each independently hydrogen, hydroxyl, straight, branched or cyclic C1-C10 alkyl, alkoxy or acyloxy group, cyano, nitro, amino, halogen, ester (—OCOR or —COOR wherein R is C1-C6 alkyl or fluoroalkyl), or carboxyl group, v is 1 or 2, p, q1, q2, q3 and q4 are in the range:
- 0<p<1.0, 0≦q1<1.0, 0≦q2<1.0, 0≦q3<1.0, 0≦q4<1.0, and 0<q1+q2+q3+q4<1.0.
Dependencies are inferred from the claim text.