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US 2014/0178807 A1Published application
Photopatternable imaging layers for controlling block copolymer microdomain orientation
AssigneeWisconsin Alumni Research Foundation
InventorsPadma Gopalan, Eungnak Han
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Abstract
The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
Claims20
A structure comprising:
- a crosslinked polymer mat, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosslinked polymer mat has a thickness of no greater than about 8 nm and the random copolymer has a crosslinking density of at least about 2%;
- and
- a self-assembled block copolymer film disposed over the crosslinked polymer mat, the self-assembled block copolymer film comprising domains oriented perpendicular to the crosslinked polymer mat.
A structure comprising:
- a substrate;
- and
- a crosslinked polymer film disposed over the substrate and configured for inducing domain orientation in a block copolymer film, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a crosslinkable monomer, and further wherein the crosslinked polymer film has a thickness of no greater than about 8 nm and the random copolymer has a crosslinking density of at least about 2%.
A structure comprising:
- a substrate;
- a crosslinked polymer film disposed over the substrate, the crosslinked polymer comprising a random copolymer polymerized from a first monomer, a second monomer, and a third monomer, wherein the third monomer is a photo-crosslinkable or thermally-crosslinkable monomer, and further wherein the crosslinked polymer film has a thickness of no greater than about 5 nm and the random copolymer has a crosslinking density of at least about 2%;
- and
- a block copolymer film defining a pattern disposed over the crosslinked polymer film;
- wherein the crosslinked polymer film produces the pattern by inducing the self-assembly of the block copolymer.
2 more elements
Dependencies are inferred from the claim text.