Electrochemical Device Including Amorphous Metal Oxide
AssigneeFord Global Technologies, LLC
InventorsJun Yang, Patrick Pietrasz, Chunchuan Xu, Richard E. Soltis, Mark S. Sulek, Robert F. Novak
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Abstract
In one or more embodiments, an electrochemical device includes a substrate having a substrate surface; an amorphous metal oxide layer supported on the substrate surface; and a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer. The amorphous metal oxide layer may contact only 25 to 75 percent of the substrate surface. The amorphous metal oxide layer may include less than 10 weight percent of crystalline metal oxide. In certain instances, the amorphous metal oxide layer is substantially free of crystalline metal oxide.
Claims20
An electrochemical device comprising:
- a substrate having a substrate surface;
- an amorphous metal oxide layer supported on the substrate surface;
- and
- a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer.
An electrochemical device comprising:
- a substrate having a substrate surface;
- an amorphous metal oxide layer supported on and contacting only 25 to 75 percent of the substrate surface, the amorphous metal oxide layer includes less than 10 weight percent of crystalline metal oxide;
- and
- a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer.
A method of forming an electrochemical device, the method comprising:
- forming an amorphous metal oxide layer on a substrate having a substrate surface, the amorphous metal oxide being of a general formula of MOx;
- and
- depositing a noble metal catalyst to form a catalyst layer supported on the amorphous metal oxide layer.
Dependencies are inferred from the claim text.