Functional film manufacturing method and functional film
AssigneeFUJIFILM Corporation
InventorsEijiro IWASE, Jiro TSUKAHARA
Life of this patent
Estimating the term…
Abstract
The present invention relates to a functional film and a method for manufacturing the same, the functional film being organically and inorganically laminated to have a desired function such as high gas barrier performance and having high adhesiveness between inorganic and organic layers. The organic layer on top of the inorganic layer contains an organic solvent; an organic compound formed of the organic layer; and a silane coupling agent with a concentration between 0.1 and 25 percentages by mass excluding the organic solvent, the organic layer uses a coating material not containing a pH controller, and the organic layer is formed through curing via a heating process after coating.
Claims12
A functional film manufacturing method for manufacturing a functional film having a support, and two or more organic layers and one or more inorganic layers alternately formed on the support, the method comprising:
- a step of forming an organic layer by a coating process and a step of forming an inorganic layer of a silicon compound by a vapor-phase deposition process, and upon formation of an organic layer overlying an inorganic layer, further comprising a step of exposing an surface of the inorganic layer to air prior to the formation of the organic layer,
- wherein the organic layer overlying the inorganic layer is formed using a coating material containing an organic solvent, an organic compound for forming the organic layer, and a silane coupling agent in an amount of 0.1 to 25 wt % in terms of concentration in the coating material exclusive of the organic solvent and containing no pH adjuster by applying the coating material onto the surface of the inorganic layer and subjecting the coating material on the inorganic layer to heating treatment and drying at a higher temperature than an azeotropic point of a by-product due to the silane coupling agent and the organic solvent or at a higher temperature than a higher one of boiling points of the by-product and the organic solvent, then curing the organic compound.
A functional film comprising a support, and two or more organic layers and one or more inorganic layers alternately formed on the support,
- wherein the inorganic layers are silicon nitride layers having “—O group” and “—OH group” introduced thereto and an organic layer overlying an inorganic layer contains a silane coupling agent in an amount of 0.1 to 25 wt % and contains no pH adjuster.
Dependencies are inferred from the claim text.