Method for producing pattern phase difference film
AssigneeDai Nippon Printing Co., Ltd.
InventorsHiroyuki Nishimura, Yoshihide Nakao, Tomoya Kawashima, Keiji Kashima
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Abstract
The present invention pertains to a pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. In a mask provided for manufacturing an alignment film, slits, which are provided for exposure treatment, are made so as to gradually narrow toward the ends in the longitudinal direction.
Claims4
A method for producing a patterned phase difference film by sequentially processing an elongated transparent film material while transporting the elongated transparent film material, comprising:
- forming a photo-alignment material film on the transparent film material;
- forming an alignment film by performing an exposure process on the photo-alignment material film by using a mask through a photo-alignment method;
- and
- forming a phase difference layer of a right-eye area applying phase difference corresponding to right-eye transmitting light and a left-eye area applying phase difference corresponding to left-eye transmitting light on the alignment film,
- wherein the exposure process is performed by irradiation of light through the mask disposed to face a roll while transporting the transparent film material wound around the roll,
- wherein the mask is formed so that slits which are used for the exposing of the photo-alignment material film a longitudinal direction of which is a direction corresponding to a longitudinal direction of the transparent film material are repetitively formed in a in a direction perpendicular to a longitudinal direction of the slit, and
- wherein the slit is formed so that one end side or two end sides in the longitudinal direction of the slit has a width being gradually decreased in the direction toward end portions in the longitudinal direction of the slit.
A mask being retained so as to face a roll for transporting an elongated transparent film material and being used for exposing a photo-alignment material film formed on the transparent film material transported by the roll,
- wherein slits used for the exposing of the photo-alignment material film are repetitively formed in a direction perpendicular to a longitudinal direction of the slits, and
- wherein the slit is formed so that one end side or two end sides in the longitudinal direction of the slit has a width being gradually decreased in the direction toward end portions in the longitudinal direction of the slit.
Dependencies are inferred from the claim text.