Chemical vapor deposition of fluorocarbon polymers
AssigneeThe Gillette Company
InventorsAndrew Vladimirovich Zhuk, Neville Sonnenberg
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Abstract
Provided is a method for forming a fluorocarbon polymer on a surface of a structure. A feedstock gas is directed through a porous heat member having a temperature sufficient to crack the feedstock gas and produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed. The structure surface is maintained at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface.
Claims19
A method for forming a fluorocarbon polymer on a surface of a structure, comprising the steps of:
- directing a feedstock gas through a porous heat member having a temperature sufficient to crack the feedstock gas to produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals and that selectively promotes (CF2)n polymerization, the reactive species being in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed;
- and
- maintaining the structure surface at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface.
A method for forming a fluorocarbon polymer on a surface of a structure, comprising the steps of:
- directing a feedstock gas through a porous heat member having a temperature sufficient to crack the feedstock gas to produce a reactive species that includes (CF2)n wherein n=1 or 2 radicals and that selectively promotes CF2 polymerization, the reactive species being in the vicinity of a structure surface on which the fluorocarbon polymer is to be formed, the feedstock gas selected from the group consisting of CF3CF(O)CF2 (HFPO), C2F4, C3F8, CF3H, CF2H2, CF2N2, CF3COCF3, CF2ClCOCF2Cl, CF2ClCOCFCl2, CF3COOH, CF2Br2, CF2HBr, CF2HCl, CF2Cl2, and CF2FCl;
- C3F6, C3F4H2, C3F2Cl4, C2F3Cl3, C3F4Cl2;
- (CF3)3PF2, (CF3)2PF3, (CF3)PF4;
- (CF3)3P, (CF3)2P—P(CF3)2, and (CF3)2PX, and CF3PX2, where X is F, Cl, or H.;
- and
- maintaining the structure surface at a temperature lower than that of the porous heat member to induce deposition and polymerization of the (CF2)n wherein n=1 or 2 radicals on the structure surface.
Dependencies are inferred from the claim text.