Pattern forming apparatus and method, and method of manufacturing substrate formed with pattern
AssigneeFUJIFILM Corporation
InventorJun KODAMA
Life of this patent
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AssigneeFUJIFILM Corporation
InventorJun KODAMA
Estimating the term…
A pattern forming apparatus includes: a laser irradiation device configured to emit and direct a beam of laser light to enter a hole through an opening section thereof formed in a substrate; a light reflection device having a reflective surface configured to reflect the laser light to irradiate an inner surface of the hole with the reflected laser light, the reflective surface being arranged on a bottom of the hole to face toward the opening section; a droplet ejection device configured to eject and deposit droplets of conductive ink into the hole; and a control device configured to control the laser irradiation device to irradiate and modify the inner surface of the hole with the laser light reflected on the reflective surface, and to control the droplet ejection device to eject and deposit the droplets of the conductive ink into the hole of which the inner surface has been modified.
A pattern forming apparatus, comprising:
A pattern forming method, comprising the steps of:
A method of manufacturing a substrate formed with patterns, the method comprising the steps of:
Dependencies are inferred from the claim text.