Apparatus and method for baking substrate
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorsMeina Zhu, Yi Dai
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AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorsMeina Zhu, Yi Dai
Estimating the term…
The present invention discloses an apparatus for baking a substrate. The apparatus includes a supporting platform, a plurality of supporting pins, a heating unit, and a thermal insulation layer. The supporting platform has a supporting surface and a bottom surface. The supporting pins are disposed in the supporting platform, and the supporting pins are capable of movably protruding from the supporting surface to lift the substrate up. The heating unit is utilized to heat the substrate. The thermal insulation layer is disposed opposite to the bottom surface of the supporting platform and utilized to prevent the heating unit from heating the supporting platform. The present invention further discloses a method for baking a substrate, and the method can effectively prevent a Mura defect appearing on the substrate.
An apparatus for baking a glass substrate, comprising:
An apparatus for baking a glass substrate, comprising:
A method for baking a glass substrate by using a supporting platform, a plurality of supporting pins disposed in the supporting platform, and a heating unit;
Dependencies are inferred from the claim text.