US 2014/0177039 A1 · SUB-WAVELENGTH EXTREME ULTRAVIOLET METAL TRANSMISSION GRATING AND MANUFACTURING METHOD THEREOF

Abstract

A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns.

Claims19

Dependent claims

A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating, comprising:

forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished;
spin-coating a silicon nitride film on a front surface of the silicon-based substrate with an electron beam resist (HSQ);
performing electron beam direct writing exposure on the HSQ, and then performing developing and fixing to form a plurality of grating line patterns having a duty cycle of 1:3 and a ring pattern surrounding the grating line patterns;
depositing a chrome material on the front surface of the silicon-based substrate through magnetron sputtering as a light-blocking layer for the grating line patterns and the ring pattern;
removing the chrome material inside the ring pattern so that only the chrome material outside the ring pattern is retained as a absorber of scattering light;
growing a gold material on the front surface of the silicon-based substrate through atomic layer deposition;
and
removing the gold material on the chrome material outside the ring pattern, between the grating line patterns, and on the grating line patterns so that only the gold material on sidewalls of the grating line patterns is retained.

5 more elements

A sub-wavelength extreme ultraviolet metal transmission grating, comprising:

a silicon-based substrate;
a silicon nitride self-supporting film window supported by the silicon-based substrate;
a plurality of grating line patterns having a duty cycle of 1:3 and being configured for phase modulation of incident light and a ring pattern surrounding the plurality of grating line patterns, the plurality of grating line patterns and the ring pattern being arranged on the silicon nitride self-supporting film window;
a gold material for amplitude modulation of the incident light formed on the silicon nitride self-supporting film window and arranged on respective sidewalls of the grating line patterns and the ring pattern;
and
a chrome material arranged outside the ring pattern on the silicon nitride self-supporting film window.

3 more elements

Dependencies are inferred from the claim text.

Sub-wavelength extreme ultraviolet metal transmission grating and manufacturing method thereof

Life of this patent

Sub-wavelength extreme ultraviolet metal transmission grating and manufacturing method thereof

Life of this patent

Abstract

Claims19