Optical imaging arrangement with individually actively supported components
AssigneeCarl Zeiss SMT GmbH
InventorYim-Bun Patrick Kwan
Life of this patent
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Abstract
An optical imaging arrangement includes an optical projection unit and a control device. The optical projection unit includes a support structure and a group of optical element units adapted to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask unit onto a substrate of a substrate unit. The group of optical element units includes a first optical element unit and a plurality of second optical element units, the first optical element unit and the second optical element units, under a control by the control device, being actively supported by the support structure.
Claims21
-50. (canceled)
An arrangement, comprising:
- an optical projection unit comprising:
- a support structure;
- and
- a group of optical element units configured to transfer an image of a pattern of a first object onto a second object;
- and
- a control device,
- wherein:
- the group of optical element units comprises a first optical element unit and a plurality of second optical element units;
- the first and second optical element units are actively supported by the support structure under control by the control device;
- the first optical element unit is actively supported at a low first control bandwidth;
- the second optical element units are actively supported at a second control bandwidth to substantially maintain a given spatial relationship of each of the second optical elements with respect to the first optical element unit;
- and
- the arrangement is an optical imaging arrangement.
An arrangement comprising:
- an optical projection unit comprising a support structure and a group of optical element units configured to transfer an image of a pattern of a first object onto a second object;
- and
- a metrology arrangement;
- wherein:
- the group of optical element units comprises a plurality of optical element units;
- the metrology arrangement is configured to capture, in at least one degree of freedom, a spatial relationship between a reference unit and an associated optical element unit of the group of optical element units;
- the metrology arrangement comprises a reference element;
- the reference element is mechanically connected directly to the associated optical element unit at a reference element location;
- selection of the reference element location is limited by spatial boundary conditions of the associated optical element unit;
- the associated optical element unit has a deformation vibration mode at a resonant frequency;
- the optical element unit, in the deformation vibration mode, exhibits deformation induced motion in the at least one degree of freedom and has at least one nodal point with minimum motion in the least one degree of freedom;
- at least one of a geometry, a mass distribution and a rigidity distribution of the optical element unit is selected as a function of the reference element location so that the reference element location is located at least close to the nodal point;
- and
- the arrangement is an optical imaging arrangement.
An arrangement, comprising:
- an optical projection unit comprising a support structure and a group of optical element units configured to transfer an image of a pattern of a first object onto a second object,
- wherein:
- the group of optical element units comprises a first optical element unit and a plurality of second optical element units;
- the first optical element unit, the second optical element units, the first object and the second object are actively supported by the support structure under a control by the control device;
- the first optical element unit is actively supported at a low first control bandwidth;
- the second optical element units are actively supported at a second control bandwidth to substantially maintain a given spatial relationship of each of the second optical elements with respect to the first optical element unit;
- the mask unit is actively supported at a third control bandwidth to substantially maintain a given spatial relationship of the mask unit with respect to the first optical element unit;
- the substrate unit is actively supported at a third control bandwidth to substantially maintain a given spatial relationship of the substrate unit with respect to the first optical element unit;
- and
- the arrangement is an optical imaging arrangement.
Dependencies are inferred from the claim text.