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US 2014/0176926 A1Published application
Euv optics
AssigneeASML Netherlands B.V.
InventorsNorbert R. BOWERING, Igor V. Fomenkov
Life of this patent
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AssigneeASML Netherlands B.V.
InventorsNorbert R. BOWERING, Igor V. Fomenkov
Estimating the term…
In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
1-44. (canceled)
A normal incidence, EUV light source collector mirror for receiving light directly from an EUV light emitting plasma and producing a shaped beam for use with a system illuminating a lithography mask with an illumination field having a pre-selected shape in a plane normal to the direction of light propagation, said mirror comprising:
An optical arrangement for homogenizing and shaping light from an EUV light emitting plasma to a mask as an illumination field having a pre-selected shape in a plane normal to the direction of light propagation, the arrangement comprising:
An optic for use with EUV light, said optic comprising;
Dependencies are inferred from the claim text.