Interference exposure device and method

An interference exposure apparatus, comprising:

• a light source for providing an exposure light beam;
• a light homogenizer-collimator for homogenizing and collimating the exposure light beam emanating from the light source;
• an interference unit including at least two gratings for converting the exposure light beam into at least two coherent light beams, the interference unit being movable in a vertical direction to make the at least two coherent light beams converge on a surface of a substrate to form an interference exposure pattern, the at least two gratings each having a period in correspondence with a period of a desired exposure pattern and being distributed in correspondence with a distribution characteristic of the desired exposure pattern;
• a driving and supporting means for supporting the substrate and carrying the substrate to move with at least three degrees of freedom;
• and
• a measuring means for measuring an angle between a coordinate system of the interference unit and a coordinate system of the driving and supporting means so as to adjust an exposure position of the driving and supporting means based on a measurement result of the measuring means before exposing the substrate.