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US 2014/0176922 A1Published application
Debris Removal in High Aspect Structures
OwnerTod Evan Robinson, Bernabe J. Arruza +1inventors
InventorsTod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler
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Abstract
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
Claims20
A system for removing debris from a surface of a photolithographic mask, comprising:
- an atomic force microscope, including:
- a cantilever, and
- a tip supported by the cantilever, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the photolithographic mask.
A system for removing debris from a surface of a substrate, comprising:
- an atomic force microscope, including:
- a cantilever, and
- a tip supported by the cantilever, the tip including a surface and a nanometer-scaled coating disposed thereon, the nanometer-scaled coating having a surface energy lower than a surface energy of the substrate.
Dependencies are inferred from the claim text.