Display device and method of manufacturing the same

A display device, comprising:

• a substrate comprising a plurality of pixel regions;
• a thin film transistor disposed on the substrate;
• a pixel electrode connected to the thin film transistor and disposed in a first pixel region;
• and
• a roof layer disposed on the pixel electrode and spaced apart from the pixel electrode with a microcavity interposed therebetween,
• wherein microcavities are disposed in the pixel regions and are connected to each other.

A display device, comprising:

• a substrate comprising a plurality of pixel regions;
• a thin film transistor disposed on the substrate;
• a pixel electrode connected to the thin film transistor and disposed in a first pixel region;
• and
• a roof layer disposed on the pixel electrode and spaced apart from the pixel electrode with a microcavity interposed therebetween,
• wherein the roof layer comprises a protruding portion protruding from an first side and a second side of the first pixel region.

A display device, comprising:

• a substrate comprising a plurality of pixel regions;
• a thin film transistor disposed on the substrate;
• a pixel electrode connected to the thin film transistor and disposed in a first pixel region;
• and
• a roof layer disposed on the pixel electrode and spaced apart from the pixel electrode with a microcavity interposed therebetween,
• wherein the microcavity is disposed in at least a portion of the first pixel region and an edge region surrounding the first pixel region.

A method of manufacturing a display device, the method comprising:

• forming a thin film transistor on a substrate;
• forming a pixel electrode connected to the thin film transistor, the pixel electrode being disposed in a pixel region;
• forming a sacrificial layer on the pixel electrode;
• forming a roof layer on the sacrificial layer;
• forming a liquid crystal injection hole in the roof layer to expose a portion of the sacrificial layer;
• removing the sacrificial layer to form a microcavity between the pixel electrode and the roof layer;
• curing the roof layer;
• injecting liquid crystal through the liquid crystal injection hole;
• and
• forming an overcoat layer on the roof layer to seal the microcavity for each pixel region,
• wherein a thickness of the sacrificial layer formed at a portion that is in contact with the liquid crystal injection hole is greater than a thickness of a residual portion.