Method of Calibrating a DPP-Generated EUV Light Source

A method for controlling a discharge plasma-based radiation source, the method comprising:

• a) determining a calibration function (HV(EP)) corresponding to values of an input quantity and values of an operating parameter of the discharge plasma-based radiation source by applying different values of the input quantity to the radiation source so that a reference value (ERef, URef) selected from the values of the operating parameter is brought about during a pulse of the radiation source;
• b) acquiring a value of a test quantity at each pulse of the radiation source, wherein any quantity influencing the emitted radiation dose can be selected as the test quantity;
• c) deriving a statistical value from a defined quantity of values of the test quantity;
• d) determining a deviation between the statistical value and the reference value (ERef, URef);
• e) stabilizing a radiation dose emitted by the radiation source in a pulsed manner by comparing the deviation with a predefined tolerance range, and proceeding according to the result:
• e1) returning to step b) if the predefined tolerance range has not been exceeded, or
• e2) returning to step a) for determining a new calibration function (HV(EP)) if the predefined tolerance range has been exceeded.