Multi charged particle beam writing apparatus
AssigneeNuFlare Technology, Inc.
InventorsTakanao TOUYA, Munehiro Ogasawara
Life of this patent
Estimating the term…
Abstract
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.
Claims11
A multi charged particle beam writing apparatus comprising:
- a stage configured to mount a target object thereon and to be movable;
- an emission unit configured to emit a charged particle beam;
- an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
- a reduction optical system configured to reduce the multiple beams;
- and
- a doublet lens, arranged at a subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.
A multi charged particle beam writing apparatus comprising:
- a stage configured to mount a target object thereon and to be movable;
- an emission means for emitting a charged particle beam;
- an aperture means, in which a plurality of openings are formed, for forming multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
- a reduction optical means for reducing the multiple beams;
- and
- a doublet lens, arranged at a subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.
Dependencies are inferred from the claim text.