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US 2014/0175051 A1Published application
Method of magnetic meida manufacturing
OwnerMichael Feldbaum, Koichi Wago +1inventors
InventorsMichael Feldbaum, Koichi Wago, David Kuo
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Abstract
The embodiments disclose a method of creating a mask by depositing a protection layer that mechanically strengthens patterned features that are imprinted into a resist layer that is deposited onto a magnetic layer, implanting mechanically strengthened patterned resist layer features into the magnetic layer using ion implantation and removing the resist layer and the mask to expose at least a portion of the magnetic layer.
Claims23
A method comprising:
- depositing a conformal protection layer on a resist layer of a substrate, the substrate comprising the resist layer over a magnetic layer, the resist layer comprising one or more resist features, wherein the resist features define one or more magnetic recording features;
- and
- creating the magnetic recording features in areas not underneath the resist features through ion implantation.
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6-7. (canceled)
9-20. (canceled)
An apparatus, comprising:
- means for depositing a conformal protection layer on a resist layer of a substrate, the substrate comprising the resist layer over a magnetic layer, the resist layer comprising one or more resist features, wherein the resist features define one or more magnetic recording features;
- and
- an ion implantation system configured to create the magnetic recording features in areas not underneath the resist features.
An apparatus comprising:
- a deposition system configured to deposit a conformal protection layer on a resist layer of a substrate, the substrate comprising the resist layer over a magnetic layer, the resist layer comprising one or more resist features, wherein the resist features define one or more magnetic recording features;
- and
- an ion implantation system for creating the magnetic recording features in areas not underneath the resist features.
Dependencies are inferred from the claim text.