Pre-patterned film-based resist

Abstract

Roll-to-roll processes for manufacturing touch sensors using a sheet of patterned photoresist film are disclosed. The photoresist film can include a sheet of photoresist material, such as DFR, that has been patterned by removing portions of the photoresist film using a die or laser cutting technique. In some examples, the photoresist film can be patterned such that the patterned photoresist film can be laminated to a base film and used as an etching mask or a photoresist layer in a roll-to-roll manufacturing process. In this way, the patterned photoresist film can be used in place of conventional photoresist films in roll-to-roll processes, thereby obviating the need for subsequent exposure and development operations that would otherwise be performed when using conventional photoresist films. As a result, the chance that a defect is introduced into the touch sensors is reduced by reducing the number of operations performed in the roll-to-roll process.

Dependencies are inferred from the claim text.