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US 2014/0174921 A1Published application
Multi-Piece Target and Magnetron to Prevent Sputtering of Target Backing Materials
AssigneeIntermolecular, Inc.
InventorsHong Sheng Yang, Chi-I Lang, ShouQian Shao
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Abstract
An apparatus for sputtering wherein magnets within the magnetron of a sputtering source are positioned such that Ar+ ions arriving at the surface of a multi-piece target do not strike the target perpendicular to the surface at the gaps between the sectors of the target. The off-angle bombardment of the Ar+ ions ensures that the Ar+ ions do not result in the sputtering and deposition of target backing material through the gap between the target sectors.
Claims13
An apparatus for sputtering, the apparatus comprising:
- a power source operable to generate ions;
- a target having a surface,
- wherein the target is comprised of a plurality of sectors,
- wherein each sector of the plurality of sectors are separated from each other by a plurality of gaps;
- a magnetron,
- wherein the magnetron comprises a magnet assembly,
- wherein the magnet assembly comprises a plurality of magnets;
- wherein each of the magnets is aligned with at least one of the plurality of sectors;
- wherein the alignment is configured such that a substantial portion of ions impacting the target at the plurality of gaps arrive at angles greater than 10 degrees, the angle measured from a reference that is perpendicular to the surface of the target.
6 more elements
Dependencies are inferred from the claim text.