Scandium-aluminum alloy sputtering targets
AssigneeAvago Technologies General IP (Singapore) Pte. Ltd.
InventorsChris Feng, Tangshiun Yeh, John Choy, Kevin J. Grannen, Phil Nikkel
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Abstract
A sputtering target comprises an alloy of scandium and aluminum, wherein the alloy has a concentration of 3-10 at % scandium and 90-97 at % aluminum. The sputtering target can be used to produce a piezoelectric layer for an apparatus such as an acoustic resonator.
Claims20
A method of manufacturing a sputtering target, comprising:
- forming a scandium-aluminum alloy comprising 3-10 at % scandium and 90-97 at % aluminum;
- and
- preparing the scandium-aluminum alloy for use as a sputtering target in plasma deposition equipment.
The method of claim I, further comprising measuring a microstructure of the scandium-aluminum alloy, comparing the measured microstructure to a desired microstructure, and adjusting a microstructure of a subsequent sputtering target according to the comparison.
A method of manufacturing an acoustic resonator structure, comprising:
- in an atmosphere containing nitrogen gas, performing a sputtering process using a sputtering target comprising a scandium aluminum alloy having 3-10 at % scandium and 90-97 at % aluminum.
An apparatus, comprising:
- a sputtering target comprising an alloy of scandium and aluminum, wherein the alloy has a concentration of 3-10 at % scandium and 90-97 at % aluminum.
Dependencies are inferred from the claim text.