US 2014/0174661 A1 · PLASMA PROCESSING CHAMBER FOR BEVEL EDGE PROCESSING

Abstract

A process chamber includes a wafer support to mount a wafer to be processed in the process chamber, with the wafer having an annular edge exclusion area. A first electrically grounded ring extends in an annular path radially outward of the edge exclusion area and is electrically isolated from the wafer support. A second electrode is configured with a center area opposite to the wafer support. A second electrically grounded ring extends in an annular path radially outward of the second electrode and the edge exclusion area. The second electrically grounded ring is electrically isolated from the center area. An annular mount section has a DC bias ring, and the DC bias ring opposes the edge exclusion area when the wafer is present. A DC control circuit is provided for applying a DC voltage to the DC bias ring.

Claims15

Dependent claims

A chamber for processing a bevel edge of a substrate, comprising:

a bottom electrode defined to support a substrate in the chamber, the bottom electrode having a bottom first level for supporting the substrate and a bottom second level near an outer edge of bottom electrode, the bottom second level defined at a step below the bottom first level;
a top electrode oriented above the bottom electrode, the top electrode having a top first level and a top second level, the top first level being opposite the bottom first level and the top second level being opposite the bottom second level, the top second level defined at a step above the top first level;
a bottom grounded electrode disposed around the bottom electrode at the bottom second level;
a top grounded electrode disposed around the top electrode at the top second level;
a bottom ring mount oriented at the bottom second level;
and
a top ring mount oriented at the top second level.

4 more elements

Dependencies are inferred from the claim text.

Plasma processing chamber for bevel edge processing

Life of this patent

Plasma processing chamber for bevel edge processing

Life of this patent

Abstract

Claims15