Optimized anti-reflection coating layer for crystalline silicon solar cells

Abstract

Embodiments of the invention include a solar cell and methods of forming a solar cell. Specifically, the methods may be used to form a passivation/anti-reflection layer having desired functional and optical properties on a solar cell substrate. In one embodiment, a method of forming an anti-reflection layer on a solar cell substrate, the method includes flowing a first processing gas mixture into a processing chamber, wherein the first processing gas mixture includes at least a silicon containing gas and a nitrogen containing gas, wherein a ratio by flow volume of the silicon containing gas to the nitrogen containing gas supplied to the first processing gas mixture is controlled at between about 2:1 to about 1:5, applying a source RF power to the processing chamber in the presence of the first processing gas mixture, controlling the process pressure under 100 mTorr, and forming a silicon nitride containing layer on the substrate.

Dependencies are inferred from the claim text.