Processing and Cleaning Substrates

A method, comprising the steps of:

• defining a plurality of site isolated regions on a top surface of a substrate;
• processing a first one of the site isolated regions differently from at least a second one of the site isolated regions;
• transferring the substrate to a chuck in a first cleaning module, wherein the chuck contacts a first part of a bottom surface of the substrate but does not contact a second part of the bottom surface of the substrate;
• dispensing a cleaning chemistry onto a top surface of the substrate, wherein a temperature of the cleaning chemistry is higher than an ambient temperature;
• dispensing a fluid onto the top surface of the substrate, wherein a temperature of the fluid is at or substantially near the ambient temperature;
• and
• drying the top surface of the substrate;
• wherein the substrate remains on the chuck during the dispensing of the cleaning chemistry, the dispensing of the fluid, and the drying;
• and
• wherein the chuck radiates heat to the first part of the bottom surface of the substrate after the dispensing of the cleaning chemistry.