Cleaning device, cleaning method, and method of manufacturing the cleaning device

A cleaning method comprising:

• positioning a cleaning device including a frame substrate, a first functional membrane and a second functional membrane, the first functional membrane and the second functional membrane on opposite surfaces of the frame substrate, on a support configured to support a substrate, during a semiconductor manufacturing process or a display manufacturing process on the substrate;
• maintaining the positioning of the cleaning device on the support for a predetermined time period;
• and
• removing the cleaning device from the support.

A method of manufacturing a device, the method comprising:

• performing processes with respect to a substrate on a support configured to support the substrate, during a semiconductor manufacturing process or a display manufacturing process;
• determining whether the support needs to be cleaned;
• when the support needs to be cleaned, cleaning the support using a cleaning device including a frame substrate, and a first functional membrane and a second functional membrane formed on opposite surfaces of the frame substrate;
• and
• positioning a new substrate on the support.

A method of manufacturing a cleaning device, the method comprising:

• preparing a frame substrate configuring a frame of the cleaning device;
• applying a liquid polymer precursor on each of opposite surfaces of the frame substrate using at least one of a coating method, a molding method, an imprinting method, a printing method, and a pulling method;
• and
• forming functional membranes on the opposite surfaces of the frame substrate by curing the liquid polymer precursor.

A cleaning device, comprising:

• a substrate;
• a first functional membrane on a first surface of the substrate, the first functional membrane configured to clean;
• and
• a second functional membrane on a second surface of the substrate opposite the first surface, the second functional membrane configured to one of clean, control contamination, stabilize temperature, maintain composition state, sample, remove unnecessary gas and reconstruct hydrophobicity.

A method of cleaning, the method comprising:

• performing a manufacturing process on a first semiconductor substrate;
• performing the manufacturing process at least once on a cleaning device, the cleaning device including a first functional membrane configured to clean and including a second functional membrane, opposite the first functional membrane, configured to one of clean, control contamination, stabilize temperature, maintain composition state, sample, remove unnecessary gas and reconstruct hydrophobicity;
• and
• performing the manufacturing process on a second semiconductor substrate.