Film forming apparatus

An apparatus for forming a film, comprising:

• a processing container which can be made vacuous;
• a loading table which is placed in the processing container and loads an object to be processed;
• a heater which heats the object loaded on the loading table to a predetermined temperature;
• an exhauster which exhausts the interior of the processing container in a pressure reducing manner;
• a raw material container holding solid raw material, M(BH4)4 (where M is Zr or Hf);
• a temperature regulator which cools or heat-insulates the solid raw material in the raw material container;
• a H2 gas feeder which feeds H2 gas into the raw material container;
• and
• a gas feeding pipe through which a mixture gas of H2 gas and M(BH4)4 gas is fed from the raw material container into the processing container;
• wherein the mixture gas of H2 gas and M(BH4)4 gas is introduced while controlling a flow rate of the M(BH4)4 gas evaporated by the feeding of the H2 gas and a volume ratio of flow rates (H2/M(BH4)4) of H2 gas and M(BH4)4 gas, by adjusting a flow rate of H2 gas fed into the raw material container and an internal pressure of the raw material container, and a MBx film (where M is Zr or Hf and x is 1.8 to 2.5) is deposited on the object using a thermal CVD.