Plasma generator and cvd device
AssigneeToshiba Mitsubishi-Electric Industrial Systems Corporation
InventorsYoichiro Tabata, Kensuke Watanabe
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Abstract
A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses the electrode cell. The electrode cell includes a first electrode, a discharge space, a second electrode, dielectrics, and a pass-through formed in a central portion in a plan view. An insulating tube having a cylindrical shape is arranged within the pass-through. Ejection holes are formed in a side surface of the cylindrical shape. The plasma generation apparatus further includes a precursor supply part that is connected to a hollow portion of the insulating tube and configured to supply a metal precursor.
Claims12
A plasma generation apparatus comprising:
- an electrode cell;
- a power source part configured to apply an AC voltage to said electrode cell;
- a housing that encloses said electrode cell;
- and
- a source gas supply part configured to supply a source gas from the outside of said housing into said housing,
- said electrode cell including:
- a first electrode;
- a second electrode facing said first electrode so as to form a discharge space;
- a dielectric arranged on at least either one of a main surface of said first electrode facing said discharge space and a main surface of said second electrode facing said discharge space;
- and
- a pass-through formed in a central portion of said electrode cell in a plan view, said pass-through penetrating said electrode cell with respect to a facing direction in which said first electrode and said second electrode face each other, said plasma generation apparatus further comprising:
- an insulating tube having a cylindrical shape and arranged in said pass-through, said insulating tube including an ejection hole that is formed in a side surface of said cylindrical shape;
- and
- a precursor supply part connected to a hollow portion of said insulating tube and configured to supply a metal precursor.
A CVD apparatus comprising:
- a plasma generation apparatus;
- and
- a CVD chamber connected to said plasma generation apparatus,
- said plasma generation apparatus including:
- an electrode cell;
- a power source part configured to apply an AC voltage to said electrode cell;
- a housing that encloses said electrode cell;
- and
- a source gas supply part configured to supply a source gas from the outside of said housing into said housing,
- said electrode cell including:
- a first electrode;
- a second electrode facing said first electrode so as to form a discharge space;
- a dielectric arranged on at least either one of a main surface of said first electrode facing said discharge space and a main surface of said second electrode facing said discharge space;
- and
- a pass-through formed in a central portion of said electrode cell in a plan view, said pass-through penetrating said electrode cell with respect to a facing direction in which said first electrode and said second electrode face each other, said plasma generation apparatus further including:
- an insulating tube having a cylindrical shape and arranged in said pass-through, said insulating tube including an ejection hole that is formed in a side surface of said cylindrical shape;
- and
- a precursor supply part connected to a hollow portion of said insulating tube and configured to supply a metal precursor,
- said CVD chamber being connected to an end portion of said insulating tube.
Dependencies are inferred from the claim text.