Substrate supporting unit and substrate processing apparatus manufacturing method of the substrate supporting unit

A substrate processing apparatus comprising:

• a chamber configured to provide an inner space in which processes are performed on a substrate;
• a substrate supporting unit disposed within the chamber to support the substrate;
• and
• a showerhead configured to supply process gases onto a top surface of the substrate supported by the substrate supporting unit,
• wherein the substrate support uniting comprises:
• a susceptor on which a substrate is placed on a top surface thereof;
• one or more heat absorbing members which are capable of being converted between a mounted position at which the heat absorbing member is disposed on an upper portion of the susceptor to thermally contact the susceptor and a released position at which the heat absorbing member is separated from the upper portion of the susceptor, the one or more heat absorbing members absorbing heat of the susceptor at the mounted position;
• and
• an edge ring having a ring shape and disposed along a sidewall of the chamber, the edge ring having a plurality of fixing slots in which the heat absorbing members are selectively inserted and fixed.

A manufacturing method of a substrate supporting unit comprising a susceptor on which a substrate is placed, the method comprising:

• measuring a temperature distribution of the susceptor to determine one or more high temperature regions, each having a high temperature greater than a reference temperature, of the substrate;
• disposing an edge ring having a plurality of fixing slots on the substrate;
• and
• selectively inserting and fixing heat absorbing members into the fixing slots respectively corresponding to the high temperature regions to adjust the temperature distribution of the susceptor.