Plasma cvd apparatus and vacuum treatment apparatus

A plasma CVD apparatus comprising:

• a vacuum vessel;
• a gas introduction part configured to introduce a process gas to the vacuum vessel;
• a discharge electrode part having a discharge surface at a position facing a substrate conveyed to a predetermined position in the vacuum vessel;
• a plasma formation part configured to form plasma between the discharge surface and the substrate conveyed to the predetermined position;
• a magnet unit being provided on a back side of the discharge surface and having a first magnet provided such that a certain one of magnetic poles thereof faces the discharge surface and a second magnet provided such that a magnetic pole opposite to the certain magnetic pole of the first magnet faces the discharge surface;
• and
• a mask part being provided on a substrate side of the discharge surface, being placed in parallel to the discharge surface, and covering an area of the discharge surface, the area surrounding a portion facing the magnet unit.