Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatus
AssigneeTokyo Electron Limited
InventorKatsuyoshi AIKAWA
Life of this patent
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Abstract
A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light upwards, an illumination reflecting plate provided above the illumination device and including a reflecting surface to reflect the light from the illumination device towards the window, and a reflection restricting part provided on the reflecting surface to form a shadow in a predetermined region that includes the target inside the chamber.
Claims20
A substrate position detecting apparatus that detects a position of a substrate inside a chamber from an image of a target inside the chamber, comprising:
- an image pickup device provided above a window that is provided on a top surface of the chamber and configured to pick up the image of the target inside the chamber through the window;
- an illumination device provided above the window and configured to irradiate light upwards;
- an illumination reflecting plate provided above the illumination device and including a reflecting surface configured to reflect the light from the illumination device towards the window;
- and
- a reflection restricting part provided on the reflecting surface of the illumination reflecting plate and configured to form a shadow in a predetermined region that includes the target inside the chamber.
Dependencies are inferred from the claim text.