Vapor deposition apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorsSang Kyu Bang, Chin Wook Chon, Kyung Don Han, Jong Wook Suk, Sung Il Han
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Abstract
There is provided a vapor phase deposition apparatus including: a reaction chamber having a susceptor with a wafer mounted thereon and depositing and growing an epitaxial thin film on the wafer; a housing having the reaction chamber disposed therein and having a window opened and closed to allow the wafer to be loaded into or unloaded from the wafer reaction chamber; and an exhaust unit discharging gas from within the housing to the outside to adjust internal pressure of the housing.
Claims16
-7. (canceled)
A vapor phase deposition apparatus, comprising:
- a reaction chamber having a susceptor with a wafer mounted thereon and depositing and growing an epitaxial thin film on the wafer;
- a housing having the reaction chamber disposed therein and having a window opened and closed to allow the wafer to be loaded into or unloaded from the reaction chamber;
- and
- an exhaust unit discharging gas from within the housing to the outside to adjust internal pressure of the housing.
A vapor phase deposition apparatus, comprising:
- a housing having a window;
- and
- a reaction chamber disposed within the housing and having a susceptor with a wafer mounted thereon,
- wherein the wafer is loaded into or unloaded from the reaction chamber within the housing through opening and closing of the window.
Dependencies are inferred from the claim text.