# US 2014/0155546 A1 · Polyimide precursor, polyimide, and coating solution for under layer film for image formation

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- Number: US 2014/0155546 A1
- Document ID: US20140155546A1
- Status: Published application
- Kind: A1
- Application number: 14/175,236
- Filed: 2014-02-07
- Published: 2014-06-05
- Earliest claimed: 2007-04-25
- Assignees: Nissan Chemical Industries, Ltd.
- Applicants: Nissan Chemical Industries, Ltd.
- Inventors: Shinichi MAEDA; Yosuke IINUMA
- Web page: https://patentgrep.com/patent/US20140155546A1

## CPC

- C09D 179/08: Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- B05D 3/067: {Curing or cross-linking the coating}
- C08G 73/1039: {comprising halogen-containing substituents}
- C08G 73/105: {with oxygen only in the diamino moiety}
- C08G 73/1064: {containing sulfur}
- C08G 73/1075: {Partially aromatic polyimides}
- C08G 73/1078: {wholly aromatic in the diamino moiety}
- G03F 7/11: having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)}
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number.

## Claims

### Claim 1

A coating solution for an under layer film for image formation comprising:
at least one type of a compound selected from a group consisting of:
(i) a polyimide precursor having a structure represented by the following formula (1):
where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number, and
(ii) a polyimide produced by dehydrating and ring closing the polyimide precursor.

### Claim 2 (depends on 1)

A cured film produced by curing the coating solution for an under layer film for image formation as claimed in claim 1.

### Claim 3 (depends on 1)

An under layer film for image formation produced by using the coating solution for an under layer film for image formation as claimed in claim 1.

### Claim 4 (depends on 1)

An under layer film for electrode pattern formation produced by using the coating solution for an under layer film for image formation as claimed in claim 1.

### Claim 5 (depends on 1)

A gate insulating film produced by using the coating solution for an under layer film for image formation as claimed in claim 1.

### Claim 6 (depends on 1)

A method for forming an under layer film for image formation, comprising:
applying the coating solution for an under layer film for image formation as claimed in claim 1 applied on a substrate,
thermosetting it, and
irradiating it with an ultraviolet ray.