# US 2014/0154962 A1 · Polishing pad

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- Number: US 2014/0154962 A1
- Document ID: US20140154962A1
- Status: Published application
- Kind: A1
- Application number: 14/232,785
- Filed: 2012-07-12
- Published: 2014-06-05
- Earliest claimed: 2011-07-15
- Assignees: Toray Industries, Inc.
- Inventors: Nana Takeuchi; Seiji Fukuda; Ryoji Okuda; Shigetaka Kasai
- Web page: https://patentgrep.com/patent/US20140154962A1

## CPC

- B24B 37/26: characterised by the shape of the lapping pad surface, e.g. grooved
- B24B 37/22: characterised by a multi-layered structure
- B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS

## Abstract

A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 90 degrees, the angle β is not smaller than 85 degrees, and the angle β is smaller than the angle α, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3×10−6 μm/Pa and not more than 4.4×10−4 μm/Pa.

## Claims

### Claim 1

A polishing pad comprising at least a polishing layer and a cushion layer, wherein
the polishing layer comprises a groove on a polishing surface, the groove having side surfaces and a bottom surface,
at least one of the side surfaces comprises a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface,
the angle α formed with the polishing surface is larger than 90 degrees, the angle (β formed with the plane parallel to the polishing surface is not smaller than 85 degrees, and the angle β formed with the plane parallel to the polishing surface is smaller than the angle α formed with the polishing surface,
a bending point depth from the polishing surface to a bending point between the first side surface and the second side surface is not less than 0.4 mm and not more than 3.0 mm, and
the cushion layer has a distortion constant of not less than 7.3×10−6 μm/Pa and not more than 4.4×10−4 μm/Pa.

### Claim 2 (depends on 1)

The polishing pad according to claim 1, wherein a difference between the angle α formed with the polishing surface and the angle β formed with the plane parallel to the polishing surface is not smaller than 10 degrees and not larger than 65 degrees.

### Claim 3 (depends on 1)

The polishing pad according to claim 1, wherein the angle α formed with the polishing surface is not smaller than 105 degrees and not larger than 150 degrees.

### Claim 4 (depends on 1)

The polishing pad according to claim 1, wherein the angle β formed with the plane parallel to the polishing surface is not smaller than 85 degrees and not larger than 95 degrees.

### Claim 5 (depends on 1)

The polishing pad according to claim 1, wherein a groove pattern on the polishing surface is grid-shaped.