# US 2014/0154885 A1 · Methods of fabricating semiconductor devices having double patterning technology > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0154885 A1 - Document ID: US20140154885A1 - Status: Published application - Kind: A1 - Application number: 14/079,282 - Filed: 2013-11-13 - Published: 2014-06-05 - Earliest claimed: 2012-11-30 - Assignees: Samsung Electronics Co., Ltd. - Applicants: Samsung Electronics Co., Ltd - Inventors: Jae-Hwang Sim; Jinhyun Shin - Web page: https://patentgrep.com/patent/US20140154885A1 ## CPC - H10P 50/73: {using masks for insulating materials} - H10P 50/71: {using masks for conductive or resistive materials} - H10P 76/4085: {characterised by the processes involved to create the masks} - H10P 76/4088: {Processes for improving the resolution of the masks} - H10B 41/10: characterised by the top-view layout - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - H10B: ELECTRONIC MEMORY DEVICES ## Abstract Methods of fabricating semiconductor devices and semiconductor devices fabricated thereby are provided. Two photolithography processes and two spacer processes are performed to provide final patterns that have a pitch that is smaller than a limitation of photolithography process. Furthermore, since initial patterns are formed to have line and pad portions simultaneously by performing a first photolithography process, there is no necessity to perform an additional photolithography process for forming the pad portion. ## Claims ### Claim 1 A method of fabricating a semiconductor device, comprising: forming an etch-target layer and a first mask layer on a substrate; forming a second mask pattern on the first mask layer, wherein the second mask pattern includes a second line portion, a second pad portion, and a second connecting portion and wherein the second connecting portion is positioned between the second line portion and the second pad portion; forming a first spacer to cover a sidewall of the second mask pattern; removing the second line portion and the second connecting portion; etching the first mask layer to form a first mask pattern, wherein the first mask pattern includes a first line portion, a first connecting portion, and a first preliminary pad portion and wherein the first line portion, the first connecting portion and the first preliminary pad portion have shapes substantially corresponding to shapes of portions of the first spacer covering the second line portion, the second connecting portion, and the second pad portion, respectively, in plan view; partially removing end portions of the first line portion and the first preliminary pad portion to form a pair of first pad portions spaced apart from each other; forming a second spacer to cover a sidewall of the first mask pattern; removing the first line portion and the first connecting portion; and etching the etch-target layer using the first pad portion and the second spacer as an etch mask. ### Claim 2 (depends on 1) The method of claim 1, wherein a width of the second line portion is three times that of the first line portion. ### Claim 3 (depends on 1) The method of claim 1, wherein a width of the first spacer is substantially equivalent to that of the second spacer. ### Claim 4 (depends on 1) The method of claim 1, wherein removing of the second line portion and the second connecting portion is performed using an isotropic etching process. ### Claim 5 (depends on 1) The method of claim 1, wherein partially removing the first preliminary pad portion is performed using an isotropic etching process. ### Claim 6 (depends on 1) The method of claim 1, further comprising: wherein forming the second mask pattern is followed by forming a third mask layer on the first mask layer; wherein removing the second line portion and the second connecting portion is followed by etching the third mask layer using the second mask pattern and the first spacer as an etch mask to form a third mask pattern; and wherein etching of the first mask layer is performed using the third mask pattern as an etch mask. ### Claim 7 (depends on 6) The method of claim 6, wherein forming of the second mask pattern comprises: forming a second mask layer on the third mask layer; forming a fourth mask pattern on the second mask layer, wherein the fourth mask pattern includes a fourth line portion, a fourth pad portion, and a fourth connecting portion and wherein the fourth connecting portions is provided between the fourth line portion and the fourth pad portion; patterning the second mask layer using the fourth mask pattern as an etch mask to form the second mask pattern, wherein, after the patterning of the second mask layer, the fourth line portion is formed to have a height that is smaller than heights of the fourth pad portion and the fourth connecting portion; and removing the fourth line portion after forming the first spacer to expose a top surface of the second line portion, wherein the fourth connecting portion and the fourth pad portion remain on the second connecting portion and the second pad portion. ### Claim 8 (depends on 6) The method of claim 6, further comprising: forming a first spacer layer to cover the second and fourth mask patterns; forming a photoresist pattern to cover the fourth connecting portion and the fourth pad portion and expose the fourth line portion; and removing the fourth line portion using the photoresist pattern as an etch mask to expose a top surface of the second line portion. ### Claim 9 (depends on 6) The method of claim 6, wherein the first mask layer and the second mask layer are formed of the same material; wherein the third mask layer and the fourth mask pattern are formed of the same material; and wherein the first spacer and the second spacer are formed of the same material. ### Claim 10 (depends on 1) The method of claim 1, wherein a space between adjacent ones of the second line portions is five times a width of the second spacer. ### Claim at position 11 11-15. (canceled) ### Claim 16 A method of forming a semiconductor device comprising: performing a first photolithography process to form initial patterns; and performing a second photolithography process to provide final patterns having a pitch smaller than a limitation of the photolithography processes. ### Claim 17 (depends on 16) The method of claim 16, wherein the initial patterns have a line portion and a pad portion. ### Claim 18 (depends on 17) The method of claim 17, further comprising forming at least one interconnection including the line portion connected to the pad portion, wherein the pad portion has a width greater than a width of the line portion and at least one concave sidewall. ### Claim 19 (depends on 18) The method of claim 18, wherein forming the at least one interconnection comprises forming a pair of interconnections adjacent to each other, and a space between a first of the pair of interconnections and a pad portion of a second of the pair of interconnections adjacent to the first of the pair of interconnections is wider than a space between the first of the pair of interconnections and the second of the pair of interconnections.